JPS52131468A - Control method for plasma etching - Google Patents

Control method for plasma etching

Info

Publication number
JPS52131468A
JPS52131468A JP4771176A JP4771176A JPS52131468A JP S52131468 A JPS52131468 A JP S52131468A JP 4771176 A JP4771176 A JP 4771176A JP 4771176 A JP4771176 A JP 4771176A JP S52131468 A JPS52131468 A JP S52131468A
Authority
JP
Japan
Prior art keywords
plasma etching
control method
control
detecting
increase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4771176A
Other languages
Japanese (ja)
Inventor
Yoshifumi Kawamoto
Hiroshi Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4771176A priority Critical patent/JPS52131468A/en
Publication of JPS52131468A publication Critical patent/JPS52131468A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To control the plasma etching in Freon gas by detecting the quantity change of the intermediate product CO2F, and thus to increase the processing accuracy.
COPYRIGHT: (C)1977,JPO&Japio
JP4771176A 1976-04-28 1976-04-28 Control method for plasma etching Pending JPS52131468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4771176A JPS52131468A (en) 1976-04-28 1976-04-28 Control method for plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4771176A JPS52131468A (en) 1976-04-28 1976-04-28 Control method for plasma etching

Publications (1)

Publication Number Publication Date
JPS52131468A true JPS52131468A (en) 1977-11-04

Family

ID=12782879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4771176A Pending JPS52131468A (en) 1976-04-28 1976-04-28 Control method for plasma etching

Country Status (1)

Country Link
JP (1) JPS52131468A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5563830A (en) * 1978-11-08 1980-05-14 Chiyou Lsi Gijutsu Kenkyu Kumiai End point detection method and its apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5563830A (en) * 1978-11-08 1980-05-14 Chiyou Lsi Gijutsu Kenkyu Kumiai End point detection method and its apparatus

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