JPS52149982A - Forming method of electrode patterns - Google Patents
Forming method of electrode patternsInfo
- Publication number
- JPS52149982A JPS52149982A JP6748276A JP6748276A JPS52149982A JP S52149982 A JPS52149982 A JP S52149982A JP 6748276 A JP6748276 A JP 6748276A JP 6748276 A JP6748276 A JP 6748276A JP S52149982 A JPS52149982 A JP S52149982A
- Authority
- JP
- Japan
- Prior art keywords
- electrode patterns
- forming method
- electrode
- material layer
- mask material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To prevent "cramping" of a mask material layer owing to the stress generated within evaporating materials and avoid the deformation of electrode pattenrs by providing second blank portions in proximity to first blank portions of a mask material layer for formation of electrode patterns and evaporating electrode metal in this state.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6748276A JPS5849018B2 (en) | 1976-06-09 | 1976-06-09 | Method of forming electrode pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6748276A JPS5849018B2 (en) | 1976-06-09 | 1976-06-09 | Method of forming electrode pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52149982A true JPS52149982A (en) | 1977-12-13 |
JPS5849018B2 JPS5849018B2 (en) | 1983-11-01 |
Family
ID=13346227
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6748276A Expired JPS5849018B2 (en) | 1976-06-09 | 1976-06-09 | Method of forming electrode pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5849018B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5940535A (en) * | 1982-08-30 | 1984-03-06 | Agency Of Ind Science & Technol | Manufacture of resist pattern |
JPS6080221A (en) * | 1983-10-11 | 1985-05-08 | Oki Electric Ind Co Ltd | Method for forming electrode by liftoff process |
JPS61216433A (en) * | 1985-03-22 | 1986-09-26 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
-
1976
- 1976-06-09 JP JP6748276A patent/JPS5849018B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5940535A (en) * | 1982-08-30 | 1984-03-06 | Agency Of Ind Science & Technol | Manufacture of resist pattern |
JPS6080221A (en) * | 1983-10-11 | 1985-05-08 | Oki Electric Ind Co Ltd | Method for forming electrode by liftoff process |
JPS61216433A (en) * | 1985-03-22 | 1986-09-26 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5849018B2 (en) | 1983-11-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5251871A (en) | Projecting method for charge particle beams | |
JPS5325113A (en) | Method for prevention of falsification | |
JPS52149982A (en) | Forming method of electrode patterns | |
JPS548972A (en) | Forming method for fine electrode of semiconductor element | |
JPS5394771A (en) | Forming method for thin film pattern | |
JPS52107600A (en) | Ferrite magnet | |
JPS51145980A (en) | A caulking method | |
JPS5320864A (en) | Film forming method | |
JPS53118372A (en) | Pattern formation by plasma etching method | |
JPS52123872A (en) | Semiconductor device and its production | |
JPS5384477A (en) | Forming method of dry etching mask | |
JPS52111382A (en) | Photo-mask producing for semi-conductor | |
JPS5349946A (en) | Formation of swelled electrode | |
JPS53358A (en) | Pin-type retainer for roller bearing | |
JPS52113679A (en) | Sputter etching method | |
JPS5325481A (en) | Molten metal container | |
JPS5299775A (en) | Pattern exposing method | |
JPS52130292A (en) | Patterning method | |
JPS53120557A (en) | Production of watch case | |
JPS5350981A (en) | Photo mask collection method | |
JPS52119867A (en) | Formation of fine pattern | |
JPS5423902A (en) | Method for manufacturing conductor | |
JPS51147958A (en) | Method for forming metal electrode | |
JPS5381079A (en) | Mask forming method | |
JPS5353966A (en) | Production of semiconductor device |