JPS56157032A - Manufacture of element having minute pattern - Google Patents

Manufacture of element having minute pattern

Info

Publication number
JPS56157032A
JPS56157032A JP6143080A JP6143080A JPS56157032A JP S56157032 A JPS56157032 A JP S56157032A JP 6143080 A JP6143080 A JP 6143080A JP 6143080 A JP6143080 A JP 6143080A JP S56157032 A JPS56157032 A JP S56157032A
Authority
JP
Japan
Prior art keywords
region
development
resist layer
pattern
unexposed region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6143080A
Other languages
Japanese (ja)
Inventor
Masaki Ito
Sotaro Edokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6143080A priority Critical patent/JPS56157032A/en
Publication of JPS56157032A publication Critical patent/JPS56157032A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable to form a minute electrode pattern by a method wherein a positive resist layer provided on a substrate is so exposed as to form an unexposed region smaller than the unexposed region necessary for the element, and development is performed till a resist layer of this region is eliminated. CONSTITUTION:The positive resist layer 2 is provided on a substrate 1, and exposure is so performed as the unexposed region 33 smaller than the minimum region 32 to form the element is formed, and development is performed till the unexposed region 33 used as a dummy pattern is eliminated forming the region 32 in a reversed pedestal type. Accordingly when the minute pattern is to be formed, because finished time of development can be confirmed by the elimination of the dummy pattern, yield can be enhanced when the electrode pattern is to be formed by the lift off technique.
JP6143080A 1980-05-09 1980-05-09 Manufacture of element having minute pattern Pending JPS56157032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6143080A JPS56157032A (en) 1980-05-09 1980-05-09 Manufacture of element having minute pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6143080A JPS56157032A (en) 1980-05-09 1980-05-09 Manufacture of element having minute pattern

Publications (1)

Publication Number Publication Date
JPS56157032A true JPS56157032A (en) 1981-12-04

Family

ID=13170837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6143080A Pending JPS56157032A (en) 1980-05-09 1980-05-09 Manufacture of element having minute pattern

Country Status (1)

Country Link
JP (1) JPS56157032A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5412672A (en) * 1977-06-30 1979-01-30 Ibm Method of controlling resist pattern development

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5412672A (en) * 1977-06-30 1979-01-30 Ibm Method of controlling resist pattern development

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