JPS55159436A - Positive type resist material and pattern forming method - Google Patents
Positive type resist material and pattern forming methodInfo
- Publication number
- JPS55159436A JPS55159436A JP5799579A JP5799579A JPS55159436A JP S55159436 A JPS55159436 A JP S55159436A JP 5799579 A JP5799579 A JP 5799579A JP 5799579 A JP5799579 A JP 5799579A JP S55159436 A JPS55159436 A JP S55159436A
- Authority
- JP
- Japan
- Prior art keywords
- resist material
- cross
- positive type
- monomer
- type resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obtain a positive type resist material superior in dry etching resistance, sensitivity, and resolution, by copolymerizing benzyl methacrylate with a specified monomer.
CONSTITUTION: Benzyl methacrylate (A), monomer incapable of cross-linking (methyl methacrylate, methylisopropenyl ketone, or the like) (B), and a monomer capable of cross-linking (a combination of methacrylic acid and methacryloyl chloride) are polymerized to form a copolymer (preferably, of 10,000W1 million molecular weight) for use in a resist material. This resist material is coated on a base to form a resist film, heat-treated at 120W250°C to cross-link the copolymer and form a three-dimensional network resist film, and a pattern is formed by irradiating it by electron beams, X-rays, or other ionization radiation, and developing it.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5799579A JPS55159436A (en) | 1979-05-14 | 1979-05-14 | Positive type resist material and pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5799579A JPS55159436A (en) | 1979-05-14 | 1979-05-14 | Positive type resist material and pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55159436A true JPS55159436A (en) | 1980-12-11 |
JPS6128982B2 JPS6128982B2 (en) | 1986-07-03 |
Family
ID=13071581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5799579A Granted JPS55159436A (en) | 1979-05-14 | 1979-05-14 | Positive type resist material and pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55159436A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5868743A (en) * | 1981-10-21 | 1983-04-23 | Hitachi Ltd | Radation sensitive organic polymer material |
-
1979
- 1979-05-14 JP JP5799579A patent/JPS55159436A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5868743A (en) * | 1981-10-21 | 1983-04-23 | Hitachi Ltd | Radation sensitive organic polymer material |
Also Published As
Publication number | Publication date |
---|---|
JPS6128982B2 (en) | 1986-07-03 |
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