JPS5653114A - Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays - Google Patents
Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet raysInfo
- Publication number
- JPS5653114A JPS5653114A JP12887079A JP12887079A JPS5653114A JP S5653114 A JPS5653114 A JP S5653114A JP 12887079 A JP12887079 A JP 12887079A JP 12887079 A JP12887079 A JP 12887079A JP S5653114 A JPS5653114 A JP S5653114A
- Authority
- JP
- Japan
- Prior art keywords
- monomer
- radiation
- polymeric material
- ultraviolet rays
- far ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000000178 monomer Substances 0.000 abstract 5
- 229920001577 copolymer Polymers 0.000 abstract 2
- 238000007720 emulsion polymerization reaction Methods 0.000 abstract 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 2
- 239000003505 polymerization initiator Substances 0.000 abstract 2
- 230000035945 sensitivity Effects 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical group 0.000 abstract 1
- 229920001519 homopolymer Polymers 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE: To prepare a polymeric material having excellent sensitivity to radiation and far ultraviolet rays and high sensitivity and resolution, and suitable as a positive-type photoresist, by the emulsion polymerization of a monomer having specific structure using a redox-type polymerization initiator.
CONSTITUTION: A homopolymer composed of (A) a monomer of formula I [R1 is methyl, halogen, or CN; R2 is H, (halogen-substituted) 1W5C alkyl, or 3W6C cycloalkyl], or a copolymer composed of the (A) monomer and (B) other monomer of formula II [R3 is H, methyl, Cl, Br, or CN; R4 is Cl, CN, carboxyl, (methoxy or ethoxy)-carbamoyl] is subjected to the emulsion polymerization using a redox-type polymerization initiator to obtain a high polymer having an average molecular weight of 600,000W 7,000,000. The amount of the (B) monomer in the copolymer is pref. ≤20mol%.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12887079A JPS5653114A (en) | 1979-10-08 | 1979-10-08 | Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12887079A JPS5653114A (en) | 1979-10-08 | 1979-10-08 | Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5653114A true JPS5653114A (en) | 1981-05-12 |
JPS6330333B2 JPS6330333B2 (en) | 1988-06-17 |
Family
ID=14995389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12887079A Granted JPS5653114A (en) | 1979-10-08 | 1979-10-08 | Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5653114A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57118240A (en) * | 1980-09-29 | 1982-07-23 | Siemens Ag | Manufacture of resist structural body |
JPS57196232A (en) * | 1981-05-29 | 1982-12-02 | Nippon Telegr & Teleph Corp <Ntt> | High sensitive and positive type resist |
JPS58113932A (en) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | Resist material and formation of resist micropattern using it |
JPH022564A (en) * | 1988-06-15 | 1990-01-08 | Toagosei Chem Ind Co Ltd | Positive type electron beam resist |
JPH021860A (en) * | 1988-06-13 | 1990-01-08 | Toppan Printing Co Ltd | Radiation sensitive positive type resist high in resolution |
JPH02264259A (en) * | 1989-04-03 | 1990-10-29 | Toppan Printing Co Ltd | Positive type resist composition and pattern forming method |
JPH0328851A (en) * | 1988-05-24 | 1991-02-07 | Toppan Printing Co Ltd | Method for forming electron beam resist pattern |
JPH05289339A (en) * | 1992-04-08 | 1993-11-05 | Toppan Printing Co Ltd | Positive electron beam resist |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4837488A (en) * | 1971-09-13 | 1973-06-02 | ||
JPS4923291A (en) * | 1972-04-27 | 1974-03-01 |
-
1979
- 1979-10-08 JP JP12887079A patent/JPS5653114A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4837488A (en) * | 1971-09-13 | 1973-06-02 | ||
JPS4923291A (en) * | 1972-04-27 | 1974-03-01 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57118240A (en) * | 1980-09-29 | 1982-07-23 | Siemens Ag | Manufacture of resist structural body |
JPH0149935B2 (en) * | 1980-09-29 | 1989-10-26 | Siemens Ag | |
JPS57196232A (en) * | 1981-05-29 | 1982-12-02 | Nippon Telegr & Teleph Corp <Ntt> | High sensitive and positive type resist |
JPS58113932A (en) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | Resist material and formation of resist micropattern using it |
JPH0358103B2 (en) * | 1981-12-26 | 1991-09-04 | Daikin Kogyo Kk | |
JPH0328851A (en) * | 1988-05-24 | 1991-02-07 | Toppan Printing Co Ltd | Method for forming electron beam resist pattern |
JPH021860A (en) * | 1988-06-13 | 1990-01-08 | Toppan Printing Co Ltd | Radiation sensitive positive type resist high in resolution |
JPH022564A (en) * | 1988-06-15 | 1990-01-08 | Toagosei Chem Ind Co Ltd | Positive type electron beam resist |
JPH02264259A (en) * | 1989-04-03 | 1990-10-29 | Toppan Printing Co Ltd | Positive type resist composition and pattern forming method |
JPH05289339A (en) * | 1992-04-08 | 1993-11-05 | Toppan Printing Co Ltd | Positive electron beam resist |
Also Published As
Publication number | Publication date |
---|---|
JPS6330333B2 (en) | 1988-06-17 |
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