JPS5653114A - Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays - Google Patents

Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays

Info

Publication number
JPS5653114A
JPS5653114A JP12887079A JP12887079A JPS5653114A JP S5653114 A JPS5653114 A JP S5653114A JP 12887079 A JP12887079 A JP 12887079A JP 12887079 A JP12887079 A JP 12887079A JP S5653114 A JPS5653114 A JP S5653114A
Authority
JP
Japan
Prior art keywords
monomer
radiation
polymeric material
ultraviolet rays
far ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12887079A
Other languages
Japanese (ja)
Other versions
JPS6330333B2 (en
Inventor
Motoyasu Saito
Kazuhiko Fukatsu
Hideaki Mukoyama
Nobuyuki Watamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kohjin Holdings Co Ltd
Kojin Co Ltd
Original Assignee
Kohjin Holdings Co Ltd
Kojin Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kohjin Holdings Co Ltd, Kojin Co Ltd filed Critical Kohjin Holdings Co Ltd
Priority to JP12887079A priority Critical patent/JPS5653114A/en
Publication of JPS5653114A publication Critical patent/JPS5653114A/en
Publication of JPS6330333B2 publication Critical patent/JPS6330333B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: To prepare a polymeric material having excellent sensitivity to radiation and far ultraviolet rays and high sensitivity and resolution, and suitable as a positive-type photoresist, by the emulsion polymerization of a monomer having specific structure using a redox-type polymerization initiator.
CONSTITUTION: A homopolymer composed of (A) a monomer of formula I [R1 is methyl, halogen, or CN; R2 is H, (halogen-substituted) 1W5C alkyl, or 3W6C cycloalkyl], or a copolymer composed of the (A) monomer and (B) other monomer of formula II [R3 is H, methyl, Cl, Br, or CN; R4 is Cl, CN, carboxyl, (methoxy or ethoxy)-carbamoyl] is subjected to the emulsion polymerization using a redox-type polymerization initiator to obtain a high polymer having an average molecular weight of 600,000W 7,000,000. The amount of the (B) monomer in the copolymer is pref. ≤20mol%.
COPYRIGHT: (C)1981,JPO&Japio
JP12887079A 1979-10-08 1979-10-08 Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays Granted JPS5653114A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12887079A JPS5653114A (en) 1979-10-08 1979-10-08 Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12887079A JPS5653114A (en) 1979-10-08 1979-10-08 Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays

Publications (2)

Publication Number Publication Date
JPS5653114A true JPS5653114A (en) 1981-05-12
JPS6330333B2 JPS6330333B2 (en) 1988-06-17

Family

ID=14995389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12887079A Granted JPS5653114A (en) 1979-10-08 1979-10-08 Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays

Country Status (1)

Country Link
JP (1) JPS5653114A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118240A (en) * 1980-09-29 1982-07-23 Siemens Ag Manufacture of resist structural body
JPS57196232A (en) * 1981-05-29 1982-12-02 Nippon Telegr & Teleph Corp <Ntt> High sensitive and positive type resist
JPS58113932A (en) * 1981-12-26 1983-07-07 Daikin Ind Ltd Resist material and formation of resist micropattern using it
JPH022564A (en) * 1988-06-15 1990-01-08 Toagosei Chem Ind Co Ltd Positive type electron beam resist
JPH021860A (en) * 1988-06-13 1990-01-08 Toppan Printing Co Ltd Radiation sensitive positive type resist high in resolution
JPH02264259A (en) * 1989-04-03 1990-10-29 Toppan Printing Co Ltd Positive type resist composition and pattern forming method
JPH0328851A (en) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd Method for forming electron beam resist pattern
JPH05289339A (en) * 1992-04-08 1993-11-05 Toppan Printing Co Ltd Positive electron beam resist

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837488A (en) * 1971-09-13 1973-06-02
JPS4923291A (en) * 1972-04-27 1974-03-01

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837488A (en) * 1971-09-13 1973-06-02
JPS4923291A (en) * 1972-04-27 1974-03-01

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118240A (en) * 1980-09-29 1982-07-23 Siemens Ag Manufacture of resist structural body
JPH0149935B2 (en) * 1980-09-29 1989-10-26 Siemens Ag
JPS57196232A (en) * 1981-05-29 1982-12-02 Nippon Telegr & Teleph Corp <Ntt> High sensitive and positive type resist
JPS58113932A (en) * 1981-12-26 1983-07-07 Daikin Ind Ltd Resist material and formation of resist micropattern using it
JPH0358103B2 (en) * 1981-12-26 1991-09-04 Daikin Kogyo Kk
JPH0328851A (en) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd Method for forming electron beam resist pattern
JPH021860A (en) * 1988-06-13 1990-01-08 Toppan Printing Co Ltd Radiation sensitive positive type resist high in resolution
JPH022564A (en) * 1988-06-15 1990-01-08 Toagosei Chem Ind Co Ltd Positive type electron beam resist
JPH02264259A (en) * 1989-04-03 1990-10-29 Toppan Printing Co Ltd Positive type resist composition and pattern forming method
JPH05289339A (en) * 1992-04-08 1993-11-05 Toppan Printing Co Ltd Positive electron beam resist

Also Published As

Publication number Publication date
JPS6330333B2 (en) 1988-06-17

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