JPS52128132A - Positive type electron beam sensitive composition - Google Patents
Positive type electron beam sensitive compositionInfo
- Publication number
- JPS52128132A JPS52128132A JP4478576A JP4478576A JPS52128132A JP S52128132 A JPS52128132 A JP S52128132A JP 4478576 A JP4478576 A JP 4478576A JP 4478576 A JP4478576 A JP 4478576A JP S52128132 A JPS52128132 A JP S52128132A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- positive type
- type electron
- beam sensitive
- sensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To enlarge developing allowance compared to conventional positive type electron beam sensitive resists, and raise sensitivity, adhesion, and acid resistance, by using a specified acrylate polymer and an azide cpd. in combination.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4478576A JPS52128132A (en) | 1976-04-20 | 1976-04-20 | Positive type electron beam sensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4478576A JPS52128132A (en) | 1976-04-20 | 1976-04-20 | Positive type electron beam sensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52128132A true JPS52128132A (en) | 1977-10-27 |
JPS57968B2 JPS57968B2 (en) | 1982-01-08 |
Family
ID=12701052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4478576A Granted JPS52128132A (en) | 1976-04-20 | 1976-04-20 | Positive type electron beam sensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52128132A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5622429A (en) * | 1979-08-01 | 1981-03-03 | Agency Of Ind Science & Technol | Photosensitive resin composition |
JPS5677843A (en) * | 1979-11-30 | 1981-06-26 | Fujitsu Ltd | Resist pattern forming method |
JPS56137347A (en) * | 1980-03-29 | 1981-10-27 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for dry development |
JPS5852634A (en) * | 1981-09-25 | 1983-03-28 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
JPS58114033A (en) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | Formation of pattern |
JPS6070442A (en) * | 1983-09-28 | 1985-04-22 | Fujitsu Ltd | Formation of pattern |
JPH0499373U (en) * | 1991-01-16 | 1992-08-27 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5038252A (en) * | 1989-01-26 | 1991-08-06 | Teradyne, Inc. | Printed circuit boards with improved electrical current control |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49103632A (en) * | 1972-12-21 | 1974-10-01 | Philips Nv |
-
1976
- 1976-04-20 JP JP4478576A patent/JPS52128132A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49103632A (en) * | 1972-12-21 | 1974-10-01 | Philips Nv |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5622429A (en) * | 1979-08-01 | 1981-03-03 | Agency Of Ind Science & Technol | Photosensitive resin composition |
JPS5719408B2 (en) * | 1979-08-01 | 1982-04-22 | ||
JPS5677843A (en) * | 1979-11-30 | 1981-06-26 | Fujitsu Ltd | Resist pattern forming method |
JPS6248211B2 (en) * | 1979-11-30 | 1987-10-13 | Fujitsu Ltd | |
JPS56137347A (en) * | 1980-03-29 | 1981-10-27 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for dry development |
JPH0128368B2 (en) * | 1980-03-29 | 1989-06-02 | Tokyo Oka Kogyo Kk | |
JPS5852634A (en) * | 1981-09-25 | 1983-03-28 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
JPH023493B2 (en) * | 1981-09-25 | 1990-01-23 | Tokyo Ohka Kogyo Co Ltd | |
JPS58114033A (en) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | Formation of pattern |
JPS6070442A (en) * | 1983-09-28 | 1985-04-22 | Fujitsu Ltd | Formation of pattern |
JPH0377989B2 (en) * | 1983-09-28 | 1991-12-12 | Fujitsu Ltd | |
JPH0499373U (en) * | 1991-01-16 | 1992-08-27 |
Also Published As
Publication number | Publication date |
---|---|
JPS57968B2 (en) | 1982-01-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5384714A (en) | High sensitivity and high contrast photographic material | |
JPS52128132A (en) | Positive type electron beam sensitive composition | |
JPS52153671A (en) | Electron beam resist and its usage | |
JPS521497A (en) | Forming method of transparent conductive indium oxide film | |
JPS5359367A (en) | Formation of electron beam resist image | |
JPS5276359A (en) | Fluorine-containing rubber compositions | |
JPS5381114A (en) | Radiation sensitive material | |
JPS5331927A (en) | Logical sum circuit | |
JPS52150458A (en) | Crosslinking of polyethylene | |
JPS52132678A (en) | High-sensitive positive type electron beam formation | |
JPS51111075A (en) | Photo etching photo mask | |
JPS5319763A (en) | Mark detector in electron beam exposure | |
JPS5223138A (en) | Sticking agent | |
JPS5338340A (en) | Display device | |
JPS53125023A (en) | Radiation sensitive resist composition | |
JPS52133340A (en) | Remoistening paste | |
JPS52106791A (en) | Enzyme electrode | |
JPS53130033A (en) | Electron beam sensitive material | |
JPS53281A (en) | Adhesive composition | |
JPS5362419A (en) | Pick up tube target | |
JPS5382327A (en) | Exposure control circuit | |
JPS51141600A (en) | Fire detecting equipment | |
JPS5518473A (en) | Ionic radiation sensitive negative type resist | |
JPS529394A (en) | Indicator | |
JPS53101243A (en) | Program sequence detector |