JPS52128132A - Positive type electron beam sensitive composition - Google Patents

Positive type electron beam sensitive composition

Info

Publication number
JPS52128132A
JPS52128132A JP4478576A JP4478576A JPS52128132A JP S52128132 A JPS52128132 A JP S52128132A JP 4478576 A JP4478576 A JP 4478576A JP 4478576 A JP4478576 A JP 4478576A JP S52128132 A JPS52128132 A JP S52128132A
Authority
JP
Japan
Prior art keywords
electron beam
positive type
type electron
beam sensitive
sensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4478576A
Other languages
Japanese (ja)
Other versions
JPS57968B2 (en
Inventor
Kenichi Kawashima
Junji Sato
Konoe Miura
Chihiro Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Mitsubishi Kasei Corp
Original Assignee
Fujitsu Ltd
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Mitsubishi Kasei Corp filed Critical Fujitsu Ltd
Priority to JP4478576A priority Critical patent/JPS52128132A/en
Publication of JPS52128132A publication Critical patent/JPS52128132A/en
Publication of JPS57968B2 publication Critical patent/JPS57968B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To enlarge developing allowance compared to conventional positive type electron beam sensitive resists, and raise sensitivity, adhesion, and acid resistance, by using a specified acrylate polymer and an azide cpd. in combination.
COPYRIGHT: (C)1977,JPO&Japio
JP4478576A 1976-04-20 1976-04-20 Positive type electron beam sensitive composition Granted JPS52128132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4478576A JPS52128132A (en) 1976-04-20 1976-04-20 Positive type electron beam sensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4478576A JPS52128132A (en) 1976-04-20 1976-04-20 Positive type electron beam sensitive composition

Publications (2)

Publication Number Publication Date
JPS52128132A true JPS52128132A (en) 1977-10-27
JPS57968B2 JPS57968B2 (en) 1982-01-08

Family

ID=12701052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4478576A Granted JPS52128132A (en) 1976-04-20 1976-04-20 Positive type electron beam sensitive composition

Country Status (1)

Country Link
JP (1) JPS52128132A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622429A (en) * 1979-08-01 1981-03-03 Agency Of Ind Science & Technol Photosensitive resin composition
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPS5852634A (en) * 1981-09-25 1983-03-28 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS58114033A (en) * 1981-12-28 1983-07-07 Fujitsu Ltd Formation of pattern
JPS6070442A (en) * 1983-09-28 1985-04-22 Fujitsu Ltd Formation of pattern
JPH0499373U (en) * 1991-01-16 1992-08-27

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5038252A (en) * 1989-01-26 1991-08-06 Teradyne, Inc. Printed circuit boards with improved electrical current control

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (en) * 1972-12-21 1974-10-01 Philips Nv

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (en) * 1972-12-21 1974-10-01 Philips Nv

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622429A (en) * 1979-08-01 1981-03-03 Agency Of Ind Science & Technol Photosensitive resin composition
JPS5719408B2 (en) * 1979-08-01 1982-04-22
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS6248211B2 (en) * 1979-11-30 1987-10-13 Fujitsu Ltd
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPH0128368B2 (en) * 1980-03-29 1989-06-02 Tokyo Oka Kogyo Kk
JPS5852634A (en) * 1981-09-25 1983-03-28 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPH023493B2 (en) * 1981-09-25 1990-01-23 Tokyo Ohka Kogyo Co Ltd
JPS58114033A (en) * 1981-12-28 1983-07-07 Fujitsu Ltd Formation of pattern
JPS6070442A (en) * 1983-09-28 1985-04-22 Fujitsu Ltd Formation of pattern
JPH0377989B2 (en) * 1983-09-28 1991-12-12 Fujitsu Ltd
JPH0499373U (en) * 1991-01-16 1992-08-27

Also Published As

Publication number Publication date
JPS57968B2 (en) 1982-01-08

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