JPS52132678A - High-sensitive positive type electron beam formation - Google Patents
High-sensitive positive type electron beam formationInfo
- Publication number
- JPS52132678A JPS52132678A JP4919376A JP4919376A JPS52132678A JP S52132678 A JPS52132678 A JP S52132678A JP 4919376 A JP4919376 A JP 4919376A JP 4919376 A JP4919376 A JP 4919376A JP S52132678 A JPS52132678 A JP S52132678A
- Authority
- JP
- Japan
- Prior art keywords
- type electron
- electron beam
- positive type
- beam formation
- sensitive positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obtain highly sensitive positive-type electron-beam-sensitive conposition by including the polymer containing the prescribed repeated units.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4919376A JPS52132678A (en) | 1976-04-28 | 1976-04-28 | High-sensitive positive type electron beam formation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4919376A JPS52132678A (en) | 1976-04-28 | 1976-04-28 | High-sensitive positive type electron beam formation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52132678A true JPS52132678A (en) | 1977-11-07 |
JPS5521332B2 JPS5521332B2 (en) | 1980-06-09 |
Family
ID=12824168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4919376A Granted JPS52132678A (en) | 1976-04-28 | 1976-04-28 | High-sensitive positive type electron beam formation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52132678A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105244A (en) * | 1979-02-06 | 1980-08-12 | Victor Co Of Japan Ltd | Electron beam resist |
JPS58113933A (en) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | Resist material and formation of resist micropattern using it |
JPS63271250A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Positive type resist material having dry etching resistance |
JPS63271253A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Positive type radiation sensitive resist having high resolution |
-
1976
- 1976-04-28 JP JP4919376A patent/JPS52132678A/en active Granted
Non-Patent Citations (1)
Title |
---|
IBM TECHNICAL DISC1OSURE BULLETIN#V16#N11=1974 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105244A (en) * | 1979-02-06 | 1980-08-12 | Victor Co Of Japan Ltd | Electron beam resist |
JPS58113933A (en) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | Resist material and formation of resist micropattern using it |
JPH0358104B2 (en) * | 1981-12-26 | 1991-09-04 | Daikin Kogyo Kk | |
JPS63271250A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Positive type resist material having dry etching resistance |
JPS63271253A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Positive type radiation sensitive resist having high resolution |
Also Published As
Publication number | Publication date |
---|---|
JPS5521332B2 (en) | 1980-06-09 |
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