JPS5672433A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS5672433A
JPS5672433A JP15030179A JP15030179A JPS5672433A JP S5672433 A JPS5672433 A JP S5672433A JP 15030179 A JP15030179 A JP 15030179A JP 15030179 A JP15030179 A JP 15030179A JP S5672433 A JPS5672433 A JP S5672433A
Authority
JP
Japan
Prior art keywords
pattern
allyl
triazine
electron beams
negative type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15030179A
Other languages
Japanese (ja)
Other versions
JPS616374B2 (en
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15030179A priority Critical patent/JPS5672433A/en
Publication of JPS5672433A publication Critical patent/JPS5672433A/en
Publication of JPS616374B2 publication Critical patent/JPS616374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To enhance dry etching characteristic, sensitivity to electron beams, etc., and resolution, by using an s-triazine allyl compound having 3 or more allyl groups mixed with another negative type polymer in fabricating a pattern for a super LSI, etc. CONSTITUTION:An s-triazine allyl compound having 3 or more allyl groups such as hexaallyl melamine is added to a solution of a negative type alkyl vinyl ether- maleic anhydride allyl aduct, etc. having 3,000-200,000 weight average mol.wt. to form a resist fluid, and this fluid is coated on an SiO2 film on a silicon substrate and dried. This is irradiated with electron beams, and developed to form a minute pattern of <=1mum size with high precision and high reproductivity. A high precision super LSI pattern is obtained by using the obtained resist pattern as a mask and CF4 in etching.
JP15030179A 1979-11-20 1979-11-20 Pattern forming method Granted JPS5672433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15030179A JPS5672433A (en) 1979-11-20 1979-11-20 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15030179A JPS5672433A (en) 1979-11-20 1979-11-20 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS5672433A true JPS5672433A (en) 1981-06-16
JPS616374B2 JPS616374B2 (en) 1986-02-26

Family

ID=15494005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15030179A Granted JPS5672433A (en) 1979-11-20 1979-11-20 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5672433A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04330709A (en) * 1991-04-25 1992-11-18 Matsushita Electric Ind Co Ltd Fine-pattern formation material and pattern formation method
JP2003073363A (en) * 2001-09-04 2003-03-12 Nippon Kayaku Co Ltd New allyl compound and method for producing the same
CN107108981A (en) * 2014-03-31 2017-08-29 陶氏环球技术有限责任公司 Cross-linkable polymer compositions, its preparation method and the product being made from it with the triamine crosslinking coagent of six pi-allyl of N, N, N ', N ', N ", N ", 1,3,5 triazine 2,4,6

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04330709A (en) * 1991-04-25 1992-11-18 Matsushita Electric Ind Co Ltd Fine-pattern formation material and pattern formation method
JP2003073363A (en) * 2001-09-04 2003-03-12 Nippon Kayaku Co Ltd New allyl compound and method for producing the same
JP4753336B2 (en) * 2001-09-04 2011-08-24 日本化薬株式会社 Novel allyl compound and process for producing the same
CN107108981A (en) * 2014-03-31 2017-08-29 陶氏环球技术有限责任公司 Cross-linkable polymer compositions, its preparation method and the product being made from it with the triamine crosslinking coagent of six pi-allyl of N, N, N ', N ', N ", N ", 1,3,5 triazine 2,4,6

Also Published As

Publication number Publication date
JPS616374B2 (en) 1986-02-26

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