JPS5492061A - Micropattern forming method - Google Patents
Micropattern forming methodInfo
- Publication number
- JPS5492061A JPS5492061A JP15816877A JP15816877A JPS5492061A JP S5492061 A JPS5492061 A JP S5492061A JP 15816877 A JP15816877 A JP 15816877A JP 15816877 A JP15816877 A JP 15816877A JP S5492061 A JPS5492061 A JP S5492061A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- pattern
- mask
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To secure the ideal adhesion between the resist and the mask in order to form a micropattern to the processed layer by giving the adhesive evaporation of the metal light sheilding layer directly on the photo resist and then obtaining the mask for photo resist patterning by patterning the evaporated light shielding layer.
CONSTITUTION: Photo resist film 6 is coated on processed layer 5 on base 4, and metal light shielding layer 7 of Cr, Al, Au and the like is evaporated directly on film 6. Then highly sensitive electron resist film 8 is coated on the entire surface, and the exposure is given after the scribing exposure via the X-rays, the electron beams and others to form pattern 8'. After this, layer 7 is etched with pattern 8' used as the mask, and minute metal pattern 7' remains under pattern 8'. The exposure and development are given again to exposed film 6, and processed layer 5 is exposed with film 6' remaining. Then layer 5 is etched using the mask of the laminated layer film formed with patterns 8', 7' and 6', and the laminated film is removed to obtain desired pattern 5'.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15816877A JPS5492061A (en) | 1977-12-29 | 1977-12-29 | Micropattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15816877A JPS5492061A (en) | 1977-12-29 | 1977-12-29 | Micropattern forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5492061A true JPS5492061A (en) | 1979-07-20 |
Family
ID=15665751
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15816877A Pending JPS5492061A (en) | 1977-12-29 | 1977-12-29 | Micropattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5492061A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5672847U (en) * | 1979-11-09 | 1981-06-15 | ||
JPS5679428A (en) * | 1979-12-03 | 1981-06-30 | Hitachi Ltd | Working of ultra-fine article |
JPS5694351A (en) * | 1979-12-26 | 1981-07-30 | Perkin Elmer Corp | Mask for xxray lithograph and production thereof |
JPS58135643U (en) * | 1982-03-05 | 1983-09-12 | 松下電工株式会社 | Solar water heater water heater structure |
JPS613489A (en) * | 1984-06-18 | 1986-01-09 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS61139792U (en) * | 1984-10-17 | 1986-08-29 | ||
US20160238937A1 (en) * | 2013-09-26 | 2016-08-18 | National Institute For Materials Science | High-sensitivity multilayer resist film and method of increasing photosensitivity of resist film |
-
1977
- 1977-12-29 JP JP15816877A patent/JPS5492061A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5672847U (en) * | 1979-11-09 | 1981-06-15 | ||
JPS5679428A (en) * | 1979-12-03 | 1981-06-30 | Hitachi Ltd | Working of ultra-fine article |
JPS5694351A (en) * | 1979-12-26 | 1981-07-30 | Perkin Elmer Corp | Mask for xxray lithograph and production thereof |
JPH0142134B2 (en) * | 1979-12-26 | 1989-09-11 | Perkin Elmer Corp | |
JPS58135643U (en) * | 1982-03-05 | 1983-09-12 | 松下電工株式会社 | Solar water heater water heater structure |
JPS613489A (en) * | 1984-06-18 | 1986-01-09 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS61139792U (en) * | 1984-10-17 | 1986-08-29 | ||
US20160238937A1 (en) * | 2013-09-26 | 2016-08-18 | National Institute For Materials Science | High-sensitivity multilayer resist film and method of increasing photosensitivity of resist film |
JPWO2015046327A1 (en) * | 2013-09-26 | 2017-03-09 | 国立研究開発法人物質・材料研究機構 | High-sensitivity laminated resist film and method for improving sensitivity of resist film |
US9703197B2 (en) * | 2013-09-26 | 2017-07-11 | National Institute For Materials Science | High-sensitivity multilayer resist film and method of increasing photosensitivity of resist film |
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