JPS53117973A - Exposure method - Google Patents

Exposure method

Info

Publication number
JPS53117973A
JPS53117973A JP3213077A JP3213077A JPS53117973A JP S53117973 A JPS53117973 A JP S53117973A JP 3213077 A JP3213077 A JP 3213077A JP 3213077 A JP3213077 A JP 3213077A JP S53117973 A JPS53117973 A JP S53117973A
Authority
JP
Japan
Prior art keywords
exposure method
copolymers
resist
polymers
combinations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3213077A
Other languages
Japanese (ja)
Inventor
Nobuji Tsuchiya
Yasuo Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3213077A priority Critical patent/JPS53117973A/en
Publication of JPS53117973A publication Critical patent/JPS53117973A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To inhibit peeling of resist at the contact exposure by using a mask coated with-CF1-CF2-CF3 or polymers or copolymers of their combinations to a thickness of less than 1μ on the surface.
COPYRIGHT: (C)1978,JPO&Japio
JP3213077A 1977-03-25 1977-03-25 Exposure method Pending JPS53117973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3213077A JPS53117973A (en) 1977-03-25 1977-03-25 Exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3213077A JPS53117973A (en) 1977-03-25 1977-03-25 Exposure method

Publications (1)

Publication Number Publication Date
JPS53117973A true JPS53117973A (en) 1978-10-14

Family

ID=12350297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3213077A Pending JPS53117973A (en) 1977-03-25 1977-03-25 Exposure method

Country Status (1)

Country Link
JP (1) JPS53117973A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514489A (en) * 1983-09-01 1985-04-30 Motorola, Inc. Photolithography process
US4735890A (en) * 1982-09-16 1988-04-05 Tokyo Ohka Kogyo Kabushiki Kaisha Photomasks for photolithographic fine patterning

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4735890A (en) * 1982-09-16 1988-04-05 Tokyo Ohka Kogyo Kabushiki Kaisha Photomasks for photolithographic fine patterning
US4514489A (en) * 1983-09-01 1985-04-30 Motorola, Inc. Photolithography process

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