JPS53117973A - Exposure method - Google Patents
Exposure methodInfo
- Publication number
- JPS53117973A JPS53117973A JP3213077A JP3213077A JPS53117973A JP S53117973 A JPS53117973 A JP S53117973A JP 3213077 A JP3213077 A JP 3213077A JP 3213077 A JP3213077 A JP 3213077A JP S53117973 A JPS53117973 A JP S53117973A
- Authority
- JP
- Japan
- Prior art keywords
- exposure method
- copolymers
- resist
- polymers
- combinations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To inhibit peeling of resist at the contact exposure by using a mask coated with-CF1-CF2-CF3 or polymers or copolymers of their combinations to a thickness of less than 1μ on the surface.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3213077A JPS53117973A (en) | 1977-03-25 | 1977-03-25 | Exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3213077A JPS53117973A (en) | 1977-03-25 | 1977-03-25 | Exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53117973A true JPS53117973A (en) | 1978-10-14 |
Family
ID=12350297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3213077A Pending JPS53117973A (en) | 1977-03-25 | 1977-03-25 | Exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53117973A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4514489A (en) * | 1983-09-01 | 1985-04-30 | Motorola, Inc. | Photolithography process |
US4735890A (en) * | 1982-09-16 | 1988-04-05 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photomasks for photolithographic fine patterning |
-
1977
- 1977-03-25 JP JP3213077A patent/JPS53117973A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4735890A (en) * | 1982-09-16 | 1988-04-05 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photomasks for photolithographic fine patterning |
US4514489A (en) * | 1983-09-01 | 1985-04-30 | Motorola, Inc. | Photolithography process |
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