JPS56140342A - Image forming composition and formation of resist image - Google Patents

Image forming composition and formation of resist image

Info

Publication number
JPS56140342A
JPS56140342A JP4338480A JP4338480A JPS56140342A JP S56140342 A JPS56140342 A JP S56140342A JP 4338480 A JP4338480 A JP 4338480A JP 4338480 A JP4338480 A JP 4338480A JP S56140342 A JPS56140342 A JP S56140342A
Authority
JP
Japan
Prior art keywords
contg
soln
compound
image
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4338480A
Other languages
Japanese (ja)
Other versions
JPH0128370B2 (en
Inventor
Yukio Ishida
Keizo Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP4338480A priority Critical patent/JPS56140342A/en
Publication of JPS56140342A publication Critical patent/JPS56140342A/en
Publication of JPH0128370B2 publication Critical patent/JPH0128370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Abstract

PURPOSE:To obtain a pattern of high accuracy by applying a soln. contg. a curable epoxy compound and a compound contg. a quinonediazido group to a substrate, drying the soln., imagewise exposing the resulting photosensitive material, heating it, and removing the exposed part by dissolution. CONSTITUTION:A soln. contg. a compound contg. a quinonediazido group such as benzoquinonediazido or naphthoquinonediazide by 10-40pts.wt. to 100pts.wt. of a curable epoxy compound such as bisphenol-A type epoxy resin or a glycidyl group- contg. monomer or (co)polymer is applied to a substrate of a metal such as Al or Cu or a silicon wafer and dried to form a photosensitive material. This material is imagewise exposed and uniformly heated to 110-220 deg.C to cure the unexposed part. The exposed part is then removed with a developer such a ethylene glycol monobutyl ether to obtain an image of high accuracy used in the manufacture of various electronic materials.
JP4338480A 1980-04-02 1980-04-02 Image forming composition and formation of resist image Granted JPS56140342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4338480A JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4338480A JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Publications (2)

Publication Number Publication Date
JPS56140342A true JPS56140342A (en) 1981-11-02
JPH0128370B2 JPH0128370B2 (en) 1989-06-02

Family

ID=12662312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4338480A Granted JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Country Status (1)

Country Link
JP (1) JPS56140342A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024545A (en) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS62123444A (en) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd Radiation sensitive resinous composition
JPH01145649A (en) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd Negative type radiation-sensitive resin composition
JP2008093090A (en) * 2006-10-10 2008-04-24 Shinko:Kk Partition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036209A (en) * 1973-06-20 1975-04-05
JPS50125806A (en) * 1974-03-25 1975-10-03
JPS5546746A (en) * 1978-09-06 1980-04-02 Minnesota Mining & Mfg Positive type photosensitive composition and product thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036209A (en) * 1973-06-20 1975-04-05
JPS50125806A (en) * 1974-03-25 1975-10-03
JPS5546746A (en) * 1978-09-06 1980-04-02 Minnesota Mining & Mfg Positive type photosensitive composition and product thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024545A (en) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPH0322618B2 (en) * 1983-07-21 1991-03-27 Japan Synthetic Rubber Co Ltd
JPS62123444A (en) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd Radiation sensitive resinous composition
JPH0322619B2 (en) * 1985-08-07 1991-03-27 Japan Synthetic Rubber Co Ltd
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
JPH01145649A (en) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd Negative type radiation-sensitive resin composition
JP2008093090A (en) * 2006-10-10 2008-04-24 Shinko:Kk Partition

Also Published As

Publication number Publication date
JPH0128370B2 (en) 1989-06-02

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