JPS5546746A - Positive type photosensitive composition and product thereof - Google Patents

Positive type photosensitive composition and product thereof

Info

Publication number
JPS5546746A
JPS5546746A JP11470279A JP11470279A JPS5546746A JP S5546746 A JPS5546746 A JP S5546746A JP 11470279 A JP11470279 A JP 11470279A JP 11470279 A JP11470279 A JP 11470279A JP S5546746 A JPS5546746 A JP S5546746A
Authority
JP
Japan
Prior art keywords
product
photosensitive composition
positive type
type photosensitive
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11470279A
Other languages
Japanese (ja)
Other versions
JPS6244256B2 (en
Inventor
Piitaa Buikesurando Jiyon
Maikeru Puresurii Richiyaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of JPS5546746A publication Critical patent/JPS5546746A/en
Publication of JPS6244256B2 publication Critical patent/JPS6244256B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
JP11470279A 1978-09-06 1979-09-06 Positive type photosensitive composition and product thereof Granted JPS5546746A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93998978A 1978-09-06 1978-09-06

Publications (2)

Publication Number Publication Date
JPS5546746A true JPS5546746A (en) 1980-04-02
JPS6244256B2 JPS6244256B2 (en) 1987-09-18

Family

ID=25474042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11470279A Granted JPS5546746A (en) 1978-09-06 1979-09-06 Positive type photosensitive composition and product thereof

Country Status (9)

Country Link
JP (1) JPS5546746A (en)
BR (1) BR7905714A (en)
CA (1) CA1119447A (en)
DE (1) DE2935904A1 (en)
FR (1) FR2435741B1 (en)
GB (1) GB2031442B (en)
IT (1) IT1162658B (en)
LU (1) LU81652A1 (en)
NL (1) NL7906588A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS58152236A (en) * 1982-03-05 1983-09-09 Toray Ind Inc Photosensitive composition
JPS6120939A (en) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd Photosensitive composition
JPS6325646A (en) * 1986-07-18 1988-02-03 Tokyo Ohka Kogyo Co Ltd Positive type photoresist composition having high heat resistance
JPS6380254A (en) * 1986-09-24 1988-04-11 Fuji Photo Film Co Ltd Photosensitive composition
JPH0358050A (en) * 1989-07-20 1991-03-13 Internatl Business Mach Corp <Ibm> Photosensitive composite and utilization of the same

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4680346A (en) * 1985-12-13 1987-07-14 Ppg Industries, Inc. Flexible primer composition and method of providing a substrate with a flexible multilayer coating
JPS6463856A (en) * 1987-05-12 1989-03-09 Sumitomo Metal Ind Method and apparatus for automatic ultrasonic flaw detection of pipe end
DE3927631A1 (en) * 1989-08-22 1991-02-28 Basf Ag IMPLEMENTATION PRODUCT, METHOD FOR THE PRODUCTION THEREOF AND THE PRODUCTABLE MIXTURE OF RADIATION
CN1083777C (en) * 1995-11-24 2002-05-01 霍西尔绘图工业有限公司 Hydrophilized support for planographic printing plates and its preparation
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (en) * 1965-11-02 1968-09-06 Ferrania Spa Manufacturing process of presensitized dies for offset printing
BE789196A (en) * 1971-09-25 1973-03-22 Kalle Ag PHOTOSENSITIVE COPY MATERIAL
CH576739A5 (en) * 1972-08-25 1976-06-15 Ciba Geigy Ag
AR205345A1 (en) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg PHOTOSENSITIVE ORGANOPHILIC COMPOSITION AND LITHOGRAPHIC PLATE PREPARED WITH THE SAME
DE2617088A1 (en) * 1975-04-29 1976-11-11 Hoechst Co American LIGHT-SENSITIVE COPY DIMENSIONS

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPH0128370B2 (en) * 1980-04-02 1989-06-02 Tokyo Ohka Kogyo Co Ltd
JPS58152236A (en) * 1982-03-05 1983-09-09 Toray Ind Inc Photosensitive composition
JPS6120939A (en) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd Photosensitive composition
JPH0462574B2 (en) * 1984-07-10 1992-10-06 Fuji Photo Film Co Ltd
JPS6325646A (en) * 1986-07-18 1988-02-03 Tokyo Ohka Kogyo Co Ltd Positive type photoresist composition having high heat resistance
JPS6380254A (en) * 1986-09-24 1988-04-11 Fuji Photo Film Co Ltd Photosensitive composition
JPH0358050A (en) * 1989-07-20 1991-03-13 Internatl Business Mach Corp <Ibm> Photosensitive composite and utilization of the same

Also Published As

Publication number Publication date
GB2031442B (en) 1982-11-10
IT1162658B (en) 1987-04-01
BR7905714A (en) 1980-05-13
DE2935904C2 (en) 1991-03-07
CA1119447A (en) 1982-03-09
LU81652A1 (en) 1980-04-21
IT7950175A0 (en) 1979-09-05
FR2435741B1 (en) 1986-10-03
NL7906588A (en) 1980-03-10
DE2935904A1 (en) 1980-03-20
JPS6244256B2 (en) 1987-09-18
FR2435741A1 (en) 1980-04-04
GB2031442A (en) 1980-04-23

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