JPS54116218A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS54116218A JPS54116218A JP2281678A JP2281678A JPS54116218A JP S54116218 A JPS54116218 A JP S54116218A JP 2281678 A JP2281678 A JP 2281678A JP 2281678 A JP2281678 A JP 2281678A JP S54116218 A JPS54116218 A JP S54116218A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2281678A JPS54116218A (en) | 1978-03-02 | 1978-03-02 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2281678A JPS54116218A (en) | 1978-03-02 | 1978-03-02 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54116218A true JPS54116218A (en) | 1979-09-10 |
Family
ID=12093205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2281678A Pending JPS54116218A (en) | 1978-03-02 | 1978-03-02 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54116218A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5557841A (en) * | 1978-10-20 | 1980-04-30 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS55123614A (en) * | 1979-03-16 | 1980-09-24 | Daicel Chem Ind Ltd | Photosensitive resin and positive type-photosensitive resin composition |
JPS55127553A (en) * | 1979-03-27 | 1980-10-02 | Daicel Chem Ind Ltd | Photosensitive composition |
JPS62136636A (en) * | 1985-12-10 | 1987-06-19 | Nec Corp | Negative resist |
JPS62149717A (en) * | 1979-03-16 | 1987-07-03 | Daicel Chem Ind Ltd | Production of photopolymer |
JPS63198046A (en) * | 1987-02-13 | 1988-08-16 | Konica Corp | Photosensitive composition having excellent treating chemical resistant and ink forming properties |
JPH0296164A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
US5407780A (en) * | 1989-12-27 | 1995-04-18 | Sumitomo Chemical Company, Limited | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4945325A (en) * | 1972-09-08 | 1974-04-30 | ||
JPS5011022A (en) * | 1973-05-29 | 1975-02-04 | ||
JPS50125806A (en) * | 1974-03-25 | 1975-10-03 |
-
1978
- 1978-03-02 JP JP2281678A patent/JPS54116218A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4945325A (en) * | 1972-09-08 | 1974-04-30 | ||
JPS5011022A (en) * | 1973-05-29 | 1975-02-04 | ||
JPS50125806A (en) * | 1974-03-25 | 1975-10-03 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5557841A (en) * | 1978-10-20 | 1980-04-30 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS5654621B2 (en) * | 1978-10-20 | 1981-12-26 | ||
JPS55123614A (en) * | 1979-03-16 | 1980-09-24 | Daicel Chem Ind Ltd | Photosensitive resin and positive type-photosensitive resin composition |
JPS6223788B2 (en) * | 1979-03-16 | 1987-05-25 | Daicel Chem | |
JPS62149717A (en) * | 1979-03-16 | 1987-07-03 | Daicel Chem Ind Ltd | Production of photopolymer |
JPS6260407B2 (en) * | 1979-03-16 | 1987-12-16 | Daicel Chem | |
JPS55127553A (en) * | 1979-03-27 | 1980-10-02 | Daicel Chem Ind Ltd | Photosensitive composition |
JPS62136636A (en) * | 1985-12-10 | 1987-06-19 | Nec Corp | Negative resist |
JPH0472221B2 (en) * | 1985-12-10 | 1992-11-17 | Nippon Electric Co | |
JPS63198046A (en) * | 1987-02-13 | 1988-08-16 | Konica Corp | Photosensitive composition having excellent treating chemical resistant and ink forming properties |
JPH0296164A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
US5407780A (en) * | 1989-12-27 | 1995-04-18 | Sumitomo Chemical Company, Limited | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2039073B (en) | Photosensitive compositions | |
GB2033598B (en) | Photosensitive elastomeric composition | |
JPS54110287A (en) | Photosensitive elastic composition | |
JPS54155292A (en) | Photoopolymerizable composition | |
JPS5523187A (en) | Photoohardening composition | |
JPS54158452A (en) | Composition | |
JPS54139654A (en) | Composition | |
JPS5579439A (en) | Photosensitive coat composition | |
JPS5523186A (en) | Photoohardening composition | |
GB2031442B (en) | Positive acting photoresist composition | |
JPS54107993A (en) | Alphaacyanoacrylate composition | |
GB2115166B (en) | Photocopying | |
JPS54125024A (en) | Photosensitive composition | |
JPS54147931A (en) | Antiiulcer composition | |
JPS54116218A (en) | Photosensitive composition | |
DE2964020D1 (en) | Photosensitive composition | |
GB2038716B (en) | Photocopying | |
GR64830B (en) | Disinfectaut composition | |
JPS54147934A (en) | Antiiangina composition | |
GB2029039B (en) | Photosensitive materials | |
JPS54126019A (en) | Photosensitive composition | |
JPS54151824A (en) | Photosensitive composition | |
GB2062266B (en) | Photosensitive composition | |
GB2026532B (en) | Dtergent composition | |
JPS5560538A (en) | Composition |