GB2031442B - Positive acting photoresist composition - Google Patents

Positive acting photoresist composition

Info

Publication number
GB2031442B
GB2031442B GB7930761A GB7930761A GB2031442B GB 2031442 B GB2031442 B GB 2031442B GB 7930761 A GB7930761 A GB 7930761A GB 7930761 A GB7930761 A GB 7930761A GB 2031442 B GB2031442 B GB 2031442B
Authority
GB
United Kingdom
Prior art keywords
photoresist composition
positive acting
acting photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7930761A
Other versions
GB2031442A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of GB2031442A publication Critical patent/GB2031442A/en
Application granted granted Critical
Publication of GB2031442B publication Critical patent/GB2031442B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
GB7930761A 1978-09-06 1979-09-05 Positive acting photoresist composition Expired GB2031442B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93998978A 1978-09-06 1978-09-06

Publications (2)

Publication Number Publication Date
GB2031442A GB2031442A (en) 1980-04-23
GB2031442B true GB2031442B (en) 1982-11-10

Family

ID=25474042

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7930761A Expired GB2031442B (en) 1978-09-06 1979-09-05 Positive acting photoresist composition

Country Status (9)

Country Link
JP (1) JPS5546746A (en)
BR (1) BR7905714A (en)
CA (1) CA1119447A (en)
DE (1) DE2935904A1 (en)
FR (1) FR2435741B1 (en)
GB (1) GB2031442B (en)
IT (1) IT1162658B (en)
LU (1) LU81652A1 (en)
NL (1) NL7906588A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS58152236A (en) * 1982-03-05 1983-09-09 Toray Ind Inc Photosensitive composition
JPS6120939A (en) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd Photosensitive composition
US4680346A (en) * 1985-12-13 1987-07-14 Ppg Industries, Inc. Flexible primer composition and method of providing a substrate with a flexible multilayer coating
JPH0654390B2 (en) * 1986-07-18 1994-07-20 東京応化工業株式会社 High heat resistance positive photoresist composition
JPS6380254A (en) * 1986-09-24 1988-04-11 Fuji Photo Film Co Ltd Photosensitive composition
JPS6463856A (en) * 1987-05-12 1989-03-09 Sumitomo Metal Ind Method and apparatus for automatic ultrasonic flaw detection of pipe end
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
DE3927631A1 (en) * 1989-08-22 1991-02-28 Basf Ag IMPLEMENTATION PRODUCT, METHOD FOR THE PRODUCTION THEREOF AND THE PRODUCTABLE MIXTURE OF RADIATION
ATE201167T1 (en) * 1995-11-24 2001-06-15 Kodak Polychrome Graphics Co HYDROPHILATED SUPPORT FOR PLANT PLATE PRINTING PLATES AND METHOD FOR THE PRODUCTION THEREOF
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (en) * 1965-11-02 1968-09-06 Ferrania Spa Manufacturing process of presensitized dies for offset printing
BE789196A (en) * 1971-09-25 1973-03-22 Kalle Ag PHOTOSENSITIVE COPY MATERIAL
CH576739A5 (en) * 1972-08-25 1976-06-15 Ciba Geigy Ag
AR205345A1 (en) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg PHOTOSENSITIVE ORGANOPHILIC COMPOSITION AND LITHOGRAPHIC PLATE PREPARED WITH THE SAME
DE2617088A1 (en) * 1975-04-29 1976-11-11 Hoechst Co American LIGHT-SENSITIVE COPY DIMENSIONS

Also Published As

Publication number Publication date
FR2435741B1 (en) 1986-10-03
GB2031442A (en) 1980-04-23
IT7950175A0 (en) 1979-09-05
DE2935904C2 (en) 1991-03-07
LU81652A1 (en) 1980-04-21
JPS6244256B2 (en) 1987-09-18
IT1162658B (en) 1987-04-01
DE2935904A1 (en) 1980-03-20
NL7906588A (en) 1980-03-10
BR7905714A (en) 1980-05-13
JPS5546746A (en) 1980-04-02
CA1119447A (en) 1982-03-09
FR2435741A1 (en) 1980-04-04

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Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PE20 Patent expired after termination of 20 years

Effective date: 19990904