JPS50125806A - - Google Patents

Info

Publication number
JPS50125806A
JPS50125806A JP3326474A JP3326474A JPS50125806A JP S50125806 A JPS50125806 A JP S50125806A JP 3326474 A JP3326474 A JP 3326474A JP 3326474 A JP3326474 A JP 3326474A JP S50125806 A JPS50125806 A JP S50125806A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3326474A
Other languages
Japanese (ja)
Other versions
JPS5723253B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3326474A priority Critical patent/JPS5723253B2/ja
Priority to DE19752512933 priority patent/DE2512933C2/en
Publication of JPS50125806A publication Critical patent/JPS50125806A/ja
Priority to US05/756,653 priority patent/US4123279A/en
Publication of JPS5723253B2 publication Critical patent/JPS5723253B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
JP3326474A 1974-03-25 1974-03-25 Expired JPS5723253B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (en) 1974-03-25 1974-03-25
DE19752512933 DE2512933C2 (en) 1974-03-25 1975-03-24 Photosensitive planographic printing plate
US05/756,653 US4123279A (en) 1974-03-25 1977-01-04 Light-sensitive o-quinonediazide containing planographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (en) 1974-03-25 1974-03-25

Publications (2)

Publication Number Publication Date
JPS50125806A true JPS50125806A (en) 1975-10-03
JPS5723253B2 JPS5723253B2 (en) 1982-05-18

Family

ID=12381649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3326474A Expired JPS5723253B2 (en) 1974-03-25 1974-03-25

Country Status (2)

Country Link
JP (1) JPS5723253B2 (en)
DE (1) DE2512933C2 (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS57157238A (en) * 1981-02-26 1982-09-28 Hoechst Ag Photosensitive mixture and copying material containing it
JPS5997146A (en) * 1982-11-26 1984-06-04 Asahi Shinbunsha:Kk Photosensitive lithographic plate
JPS61193145A (en) * 1985-02-21 1986-08-27 Japan Synthetic Rubber Co Ltd Ionizing radiation sensitive pattern-forming material
JPS62136636A (en) * 1985-12-10 1987-06-19 Nec Corp Negative resist
JPH02185556A (en) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd Radiation-sensitive resin composition
JPH02306245A (en) * 1990-05-01 1990-12-19 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
EP0762208A2 (en) 1995-09-08 1997-03-12 Konica Corporation Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate
US7217499B2 (en) 2003-12-26 2007-05-15 Okamoto Chemical Industry Co., Ltd. Aluminum support for lithographic printing plate and base plate for lithographic printing plate
EP2042338A2 (en) 2007-09-26 2009-04-01 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042339A2 (en) 2007-09-26 2009-04-01 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2090430A2 (en) 2008-02-15 2009-08-19 Okamoto Chemical Industry Co., Ltd Photosensitive composition and lithographic printing original plate using the composition
EP2098377A2 (en) 2008-03-07 2009-09-09 FUJIFILM Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2233311A1 (en) 2009-03-25 2010-09-29 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2543518A2 (en) 2011-07-05 2013-01-09 Fujifilm Corporation Fountain solution composition for lithographic printing

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
DE2616992A1 (en) * 1976-04-17 1977-11-03 Agfa Gevaert Ag Photopolymer printing plate and photoresist compsn. - contain alkyl-phenol novolak giving elasticity and stability towards alkali
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5986046A (en) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS5988734A (en) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd Photosensitive composition
JPH0654390B2 (en) * 1986-07-18 1994-07-20 東京応化工業株式会社 High heat resistance positive photoresist composition
JPH02254450A (en) * 1989-03-29 1990-10-15 Toshiba Corp Resist
TW202504B (en) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
DE4013575C2 (en) * 1990-04-27 1994-08-11 Basf Ag Process for making negative relief copies

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146167A1 (en) * 1970-09-16 1972-03-23 Konismroku Photo Industry Co , Ltd, Tokio Photosensitive mass
JPS4863802A (en) * 1971-12-13 1973-09-05

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522478B1 (en) * 1965-12-17 1971-07-29 Polychrome Corp Presensitized, positive working planographic printing plate
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146167A1 (en) * 1970-09-16 1972-03-23 Konismroku Photo Industry Co , Ltd, Tokio Photosensitive mass
JPS4863802A (en) * 1971-12-13 1973-09-05

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
JPS6260701B2 (en) * 1978-06-16 1987-12-17 Fuji Photo Film Co Ltd
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5654621B2 (en) * 1978-10-20 1981-12-26
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPH0128370B2 (en) * 1980-04-02 1989-06-02 Tokyo Ohka Kogyo Co Ltd
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS57157238A (en) * 1981-02-26 1982-09-28 Hoechst Ag Photosensitive mixture and copying material containing it
JPH0223859B2 (en) * 1981-02-26 1990-05-25 Hoechst Ag
JPS5997146A (en) * 1982-11-26 1984-06-04 Asahi Shinbunsha:Kk Photosensitive lithographic plate
JPS6261946B2 (en) * 1982-11-26 1987-12-24 Asahi Shinbunsha Kk
JPS61193145A (en) * 1985-02-21 1986-08-27 Japan Synthetic Rubber Co Ltd Ionizing radiation sensitive pattern-forming material
JPH0549096B2 (en) * 1985-02-21 1993-07-23 Japan Synthetic Rubber Co Ltd
JPS62136636A (en) * 1985-12-10 1987-06-19 Nec Corp Negative resist
JPH0472221B2 (en) * 1985-12-10 1992-11-17 Nippon Electric Co
JPH02185556A (en) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd Radiation-sensitive resin composition
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
JPH02306245A (en) * 1990-05-01 1990-12-19 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
EP0762208A2 (en) 1995-09-08 1997-03-12 Konica Corporation Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate
US7217499B2 (en) 2003-12-26 2007-05-15 Okamoto Chemical Industry Co., Ltd. Aluminum support for lithographic printing plate and base plate for lithographic printing plate
EP2042338A2 (en) 2007-09-26 2009-04-01 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2042339A2 (en) 2007-09-26 2009-04-01 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2090430A2 (en) 2008-02-15 2009-08-19 Okamoto Chemical Industry Co., Ltd Photosensitive composition and lithographic printing original plate using the composition
EP2098377A2 (en) 2008-03-07 2009-09-09 FUJIFILM Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2233311A1 (en) 2009-03-25 2010-09-29 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2543518A2 (en) 2011-07-05 2013-01-09 Fujifilm Corporation Fountain solution composition for lithographic printing

Also Published As

Publication number Publication date
JPS5723253B2 (en) 1982-05-18
DE2512933A1 (en) 1975-10-02
DE2512933C2 (en) 1983-11-10

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