JPS5723253B2 - - Google Patents

Info

Publication number
JPS5723253B2
JPS5723253B2 JP3326474A JP3326474A JPS5723253B2 JP S5723253 B2 JPS5723253 B2 JP S5723253B2 JP 3326474 A JP3326474 A JP 3326474A JP 3326474 A JP3326474 A JP 3326474A JP S5723253 B2 JPS5723253 B2 JP S5723253B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3326474A
Other languages
Japanese (ja)
Other versions
JPS50125806A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3326474A priority Critical patent/JPS5723253B2/ja
Priority to DE19752512933 priority patent/DE2512933C2/en
Publication of JPS50125806A publication Critical patent/JPS50125806A/ja
Priority to US05/756,653 priority patent/US4123279A/en
Publication of JPS5723253B2 publication Critical patent/JPS5723253B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP3326474A 1974-03-25 1974-03-25 Expired JPS5723253B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (en) 1974-03-25 1974-03-25
DE19752512933 DE2512933C2 (en) 1974-03-25 1975-03-24 Photosensitive planographic printing plate
US05/756,653 US4123279A (en) 1974-03-25 1977-01-04 Light-sensitive o-quinonediazide containing planographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (en) 1974-03-25 1974-03-25

Publications (2)

Publication Number Publication Date
JPS50125806A JPS50125806A (en) 1975-10-03
JPS5723253B2 true JPS5723253B2 (en) 1982-05-18

Family

ID=12381649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3326474A Expired JPS5723253B2 (en) 1974-03-25 1974-03-25

Country Status (2)

Country Link
JP (1) JPS5723253B2 (en)
DE (1) DE2512933C2 (en)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
DE2616992A1 (en) * 1976-04-17 1977-11-03 Agfa Gevaert Ag Photopolymer printing plate and photoresist compsn. - contain alkyl-phenol novolak giving elasticity and stability towards alkali
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
DE3107109A1 (en) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE AND COPY MATERIAL MADE THEREOF
JPS5986046A (en) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS5988734A (en) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd Photosensitive composition
JPS5997146A (en) * 1982-11-26 1984-06-04 Asahi Shinbunsha:Kk Photosensitive lithographic plate
JPS61193145A (en) * 1985-02-21 1986-08-27 Japan Synthetic Rubber Co Ltd Ionizing radiation sensitive pattern-forming material
JPS62136636A (en) * 1985-12-10 1987-06-19 Nec Corp Negative resist
JPH0654390B2 (en) * 1986-07-18 1994-07-20 東京応化工業株式会社 High heat resistance positive photoresist composition
JP2800217B2 (en) * 1989-01-11 1998-09-21 ジェイエスアール株式会社 Radiation-sensitive resin composition for integrated circuit production
JPH02254450A (en) * 1989-03-29 1990-10-15 Toshiba Corp Resist
DE69029104T2 (en) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxanes and positive working resist
JP3063148B2 (en) * 1989-12-27 2000-07-12 住友化学工業株式会社 Positive resist composition
TW202504B (en) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
DE4013575C2 (en) * 1990-04-27 1994-08-11 Basf Ag Process for making negative relief copies
JPH0656488B2 (en) * 1990-05-01 1994-07-27 日本合成ゴム株式会社 Positive photosensitive resin composition
US5773194A (en) 1995-09-08 1998-06-30 Konica Corporation Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate
JP4527509B2 (en) 2003-12-26 2010-08-18 岡本化学工業株式会社 Aluminum support for lithographic printing plate and lithographic printing plate precursor
EP2042339B1 (en) 2007-09-26 2013-05-22 FUJIFILM Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2042338A3 (en) 2007-09-26 2010-03-10 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
JP2009083106A (en) 2007-09-27 2009-04-23 Fujifilm Corp Lithographic printing plate surface protective agent and plate making method for lithographic printing plate
JP5089422B2 (en) 2008-02-15 2012-12-05 岡本化学工業株式会社 Photosensitive composition and lithographic printing plate precursor using the same
JP2009234247A (en) 2008-03-07 2009-10-15 Fujifilm Corp Dampening water composition for lithographic printing and heat-set rotary offset printing process
JP5288268B2 (en) 2009-03-25 2013-09-11 富士フイルム株式会社 Dampening solution composition for lithographic printing and heat set-off ring printing method
JP5281130B2 (en) 2011-07-05 2013-09-04 富士フイルム株式会社 Dampening solution composition for lithographic printing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146167A1 (en) * 1970-09-16 1972-03-23 Konismroku Photo Industry Co , Ltd, Tokio Photosensitive mass
JPS4863802A (en) * 1971-12-13 1973-09-05

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1113759A (en) * 1965-12-17 1968-05-15 Fuji Photo Film Co Ltd Lithographic printing plates
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146167A1 (en) * 1970-09-16 1972-03-23 Konismroku Photo Industry Co , Ltd, Tokio Photosensitive mass
JPS4863802A (en) * 1971-12-13 1973-09-05

Also Published As

Publication number Publication date
JPS50125806A (en) 1975-10-03
DE2512933C2 (en) 1983-11-10
DE2512933A1 (en) 1975-10-02

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