IT1162658B - IMPROVEMENT IN POSITIVE ACTION PHOTOSENSITIVE COMPOSITIONS PARTICULARLY USEFUL AS A PHOTORESIST COMPOSITION - Google Patents

IMPROVEMENT IN POSITIVE ACTION PHOTOSENSITIVE COMPOSITIONS PARTICULARLY USEFUL AS A PHOTORESIST COMPOSITION

Info

Publication number
IT1162658B
IT1162658B IT50175/79A IT5017579A IT1162658B IT 1162658 B IT1162658 B IT 1162658B IT 50175/79 A IT50175/79 A IT 50175/79A IT 5017579 A IT5017579 A IT 5017579A IT 1162658 B IT1162658 B IT 1162658B
Authority
IT
Italy
Prior art keywords
improvement
particularly useful
photoresist composition
photosensitive compositions
positive action
Prior art date
Application number
IT50175/79A
Other languages
Italian (it)
Other versions
IT7950175A0 (en
Inventor
John P Vikesland
Richard M Presley
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of IT7950175A0 publication Critical patent/IT7950175A0/en
Application granted granted Critical
Publication of IT1162658B publication Critical patent/IT1162658B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
IT50175/79A 1978-09-06 1979-09-05 IMPROVEMENT IN POSITIVE ACTION PHOTOSENSITIVE COMPOSITIONS PARTICULARLY USEFUL AS A PHOTORESIST COMPOSITION IT1162658B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93998978A 1978-09-06 1978-09-06

Publications (2)

Publication Number Publication Date
IT7950175A0 IT7950175A0 (en) 1979-09-05
IT1162658B true IT1162658B (en) 1987-04-01

Family

ID=25474042

Family Applications (1)

Application Number Title Priority Date Filing Date
IT50175/79A IT1162658B (en) 1978-09-06 1979-09-05 IMPROVEMENT IN POSITIVE ACTION PHOTOSENSITIVE COMPOSITIONS PARTICULARLY USEFUL AS A PHOTORESIST COMPOSITION

Country Status (9)

Country Link
JP (1) JPS5546746A (en)
BR (1) BR7905714A (en)
CA (1) CA1119447A (en)
DE (1) DE2935904A1 (en)
FR (1) FR2435741B1 (en)
GB (1) GB2031442B (en)
IT (1) IT1162658B (en)
LU (1) LU81652A1 (en)
NL (1) NL7906588A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS58152236A (en) * 1982-03-05 1983-09-09 Toray Ind Inc Photosensitive composition
JPS6120939A (en) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd Photosensitive composition
US4680346A (en) * 1985-12-13 1987-07-14 Ppg Industries, Inc. Flexible primer composition and method of providing a substrate with a flexible multilayer coating
JPH0654390B2 (en) * 1986-07-18 1994-07-20 東京応化工業株式会社 High heat resistance positive photoresist composition
JPS6380254A (en) * 1986-09-24 1988-04-11 Fuji Photo Film Co Ltd Photosensitive composition
JPS6463856A (en) * 1987-05-12 1989-03-09 Sumitomo Metal Ind Method and apparatus for automatic ultrasonic flaw detection of pipe end
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
DE3927631A1 (en) * 1989-08-22 1991-02-28 Basf Ag IMPLEMENTATION PRODUCT, METHOD FOR THE PRODUCTION THEREOF AND THE PRODUCTABLE MIXTURE OF RADIATION
TR199800911T2 (en) * 1995-11-24 2000-08-21 Horsell Graphic Industries Limited Planographic printing plates hydrophilized support and its preparation.
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (en) * 1965-11-02 1968-09-06 Ferrania Spa Manufacturing process of presensitized dies for offset printing
BE789196A (en) * 1971-09-25 1973-03-22 Kalle Ag PHOTOSENSITIVE COPY MATERIAL
CH576739A5 (en) * 1972-08-25 1976-06-15 Ciba Geigy Ag
AR205345A1 (en) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg PHOTOSENSITIVE ORGANOPHILIC COMPOSITION AND LITHOGRAPHIC PLATE PREPARED WITH THE SAME
DE2617088A1 (en) * 1975-04-29 1976-11-11 Hoechst Co American LIGHT-SENSITIVE COPY DIMENSIONS

Also Published As

Publication number Publication date
DE2935904A1 (en) 1980-03-20
BR7905714A (en) 1980-05-13
LU81652A1 (en) 1980-04-21
GB2031442B (en) 1982-11-10
FR2435741B1 (en) 1986-10-03
IT7950175A0 (en) 1979-09-05
JPS5546746A (en) 1980-04-02
NL7906588A (en) 1980-03-10
JPS6244256B2 (en) 1987-09-18
FR2435741A1 (en) 1980-04-04
GB2031442A (en) 1980-04-23
CA1119447A (en) 1982-03-09
DE2935904C2 (en) 1991-03-07

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19960926