JPS54109382A - Electron ray exposure - Google Patents

Electron ray exposure

Info

Publication number
JPS54109382A
JPS54109382A JP1627178A JP1627178A JPS54109382A JP S54109382 A JPS54109382 A JP S54109382A JP 1627178 A JP1627178 A JP 1627178A JP 1627178 A JP1627178 A JP 1627178A JP S54109382 A JPS54109382 A JP S54109382A
Authority
JP
Japan
Prior art keywords
mask
value
zero
motor
shift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1627178A
Other languages
Japanese (ja)
Other versions
JPS5731290B2 (en
Inventor
Nobuo Goto
Masaru Ohashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP1627178A priority Critical patent/JPS54109382A/en
Publication of JPS54109382A publication Critical patent/JPS54109382A/en
Publication of JPS5731290B2 publication Critical patent/JPS5731290B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Abstract

PURPOSE:To perform fine exposure, by making correction in parallel with the X and Y direction of test piece for the side of the mask hole determining the beam section. CONSTITUTION:CP generation 12, DA conversion 13, and amplification 14 are made with the instruction of the computer 11, allowing to deflect 6 electron beams, and two W wires 8 orthogonal each other are scanned toward X. The electron ray dose detected 9 is grandually reduced into zero. When the Y side of beam is shifted by the angle theta' corresponding to the shift to the mask and test stand, corresponding current waveform can be otained. The peak value of the waveform is detected 18 by differentiating it primarily and secondary 16, 17. This is the signal from each side toward Y of the mask m1. This value is tentatively stored, producing 19 the control signal, and the motor 20 is driven 21, sequentially turning m and approaching the shift theta' to zero. During this, the peak value is compared 19 with the result of scanning before, and if no difference is present with the stored value, the motor is stopped. Thus, unbalance is corrected and exposure can be made with good accuracy.
JP1627178A 1978-02-15 1978-02-15 Electron ray exposure Granted JPS54109382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1627178A JPS54109382A (en) 1978-02-15 1978-02-15 Electron ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1627178A JPS54109382A (en) 1978-02-15 1978-02-15 Electron ray exposure

Publications (2)

Publication Number Publication Date
JPS54109382A true JPS54109382A (en) 1979-08-27
JPS5731290B2 JPS5731290B2 (en) 1982-07-03

Family

ID=11911873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1627178A Granted JPS54109382A (en) 1978-02-15 1978-02-15 Electron ray exposure

Country Status (1)

Country Link
JP (1) JPS54109382A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5588328A (en) * 1978-12-27 1980-07-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method to electron beam
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam
JPS59169132A (en) * 1983-03-16 1984-09-25 Hitachi Ltd Drawing device by electron beam

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62160975A (en) * 1986-12-25 1987-07-16 本田技研工業株式会社 Cooling device for rear cushion unit

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5549768A (en) * 1978-10-02 1980-04-10 Ibm Data processor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5549768A (en) * 1978-10-02 1980-04-10 Ibm Data processor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5588328A (en) * 1978-12-27 1980-07-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method to electron beam
JPS6244406B2 (en) * 1978-12-27 1987-09-21 Cho Eru Esu Ai Gijutsu Kenkyu Kumiai
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam
JPS59169132A (en) * 1983-03-16 1984-09-25 Hitachi Ltd Drawing device by electron beam

Also Published As

Publication number Publication date
JPS5731290B2 (en) 1982-07-03

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