JPS5588328A - Exposing method to electron beam - Google Patents

Exposing method to electron beam

Info

Publication number
JPS5588328A
JPS5588328A JP16245178A JP16245178A JPS5588328A JP S5588328 A JPS5588328 A JP S5588328A JP 16245178 A JP16245178 A JP 16245178A JP 16245178 A JP16245178 A JP 16245178A JP S5588328 A JPS5588328 A JP S5588328A
Authority
JP
Japan
Prior art keywords
electron beam
waveform
slender wire
rectangular
obtainable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16245178A
Other languages
Japanese (ja)
Other versions
JPS6244406B2 (en
Inventor
Junichi Kai
Takashi Yahano
Nobuyuki Yasutake
Toru Funayama
Hideo Matsumoto
Tadashi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP16245178A priority Critical patent/JPS5588328A/en
Publication of JPS5588328A publication Critical patent/JPS5588328A/en
Publication of JPS6244406B2 publication Critical patent/JPS6244406B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable the detection of the side direction of an electron beam having a rectangular sectional shape using a signal generated by scanning the electron beam in the direction crossing vertically after arranging a linear member or the like on the surface to be irradiated. CONSTITUTION:A slender wire 102 is arranged on the surface to be irradiated of a rectangular electron beam, and the rectangular electron beam 101 is scanned at a low speed in parallel therewith, as deflecting at a high speed, in the direction crossing vertically with said slender wire. A waveform 103 is obtainable by subjecting a detection signal obtained then to a voltage conversion, and a waveform 104 is obtainable by allowing it to pass through a high-cut filter, which develops to waveforms 105, 106 respectively by the primary and secondary differential treatments. The interval between pulses 33 and 33' of the secondary differential waveform 106 corresponds to a gap with the slender wire in the scanning direction, therefore an adjustment to minimize said interval is to regulate the deflection scanning direction in parallel with the slender wire 102.
JP16245178A 1978-12-27 1978-12-27 Exposing method to electron beam Granted JPS5588328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16245178A JPS5588328A (en) 1978-12-27 1978-12-27 Exposing method to electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16245178A JPS5588328A (en) 1978-12-27 1978-12-27 Exposing method to electron beam

Publications (2)

Publication Number Publication Date
JPS5588328A true JPS5588328A (en) 1980-07-04
JPS6244406B2 JPS6244406B2 (en) 1987-09-21

Family

ID=15754852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16245178A Granted JPS5588328A (en) 1978-12-27 1978-12-27 Exposing method to electron beam

Country Status (1)

Country Link
JP (1) JPS5588328A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS54109382A (en) * 1978-02-15 1979-08-27 Jeol Ltd Electron ray exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS54109382A (en) * 1978-02-15 1979-08-27 Jeol Ltd Electron ray exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam

Also Published As

Publication number Publication date
JPS6244406B2 (en) 1987-09-21

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