JPS57210549A - Method of correction attendant on deflection - Google Patents
Method of correction attendant on deflectionInfo
- Publication number
- JPS57210549A JPS57210549A JP9392081A JP9392081A JPS57210549A JP S57210549 A JPS57210549 A JP S57210549A JP 9392081 A JP9392081 A JP 9392081A JP 9392081 A JP9392081 A JP 9392081A JP S57210549 A JPS57210549 A JP S57210549A
- Authority
- JP
- Japan
- Prior art keywords
- corpuscular beam
- charged corpuscular
- deflection
- marks
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To correct various aberrations attendant on deflection, by arranging at least eight marks in the vicinity of a deflecting field on the surface of irradiation, while irradiating a charged corpuscular beam to these marks, in reference to a charged corpuscular beam allied unit. CONSTITUTION:Marks 1-8 are added to the vicinity of a deflecting field in advance. When a charged corpuscular beam 11 is scanned on each mark, a secondary charged corpuscular beam is generated from the sample face and the incident beam falls in a detector 16. At this moment, the generating value of the charged corpuscular beam from the top of the mark and from the outside of it is different so that if the value is checked by the detector 16, relationships between this signal value to a deflector 14 and the mark position and the converged size of the charged corpuscular beam, etc., are made out. This operation is carried out by a measuring system 17. For example, each factor is found by a factorial determination system 18 with a minimal square-law, etc. On a basis of this factor, when deflection is carried out at a desirable position, a correction signal 20 is to be found by this factor and accurate correction comes achieved by the detector 21.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9392081A JPS57210549A (en) | 1981-06-19 | 1981-06-19 | Method of correction attendant on deflection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9392081A JPS57210549A (en) | 1981-06-19 | 1981-06-19 | Method of correction attendant on deflection |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57210549A true JPS57210549A (en) | 1982-12-24 |
Family
ID=14095890
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9392081A Pending JPS57210549A (en) | 1981-06-19 | 1981-06-19 | Method of correction attendant on deflection |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57210549A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61174629A (en) * | 1985-01-28 | 1986-08-06 | Hitachi Ltd | Electron beam image drawing apparatus |
JPS61177718A (en) * | 1985-02-04 | 1986-08-09 | Hitachi Ltd | Electron beam lithography equipment |
JPS632320A (en) * | 1986-06-23 | 1988-01-07 | Agency Of Ind Science & Technol | Corerection for deflecting distortion in focused ion beam |
JPS63150842A (en) * | 1986-12-15 | 1988-06-23 | Nichidenshi Tekunikusu:Kk | Scanning electron microscope |
JPH01130458A (en) * | 1987-11-16 | 1989-05-23 | Nichidenshi Tekunikusu:Kk | Distortion correcting device for scanning electron microscope image |
AT394086B (en) * | 1988-03-22 | 1992-01-27 | Roto Frank Eisenwaren | ADJUSTABLE TAPE FOR WINDOW OR DOOR SHUTTERS |
-
1981
- 1981-06-19 JP JP9392081A patent/JPS57210549A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61174629A (en) * | 1985-01-28 | 1986-08-06 | Hitachi Ltd | Electron beam image drawing apparatus |
JPS61177718A (en) * | 1985-02-04 | 1986-08-09 | Hitachi Ltd | Electron beam lithography equipment |
JPS632320A (en) * | 1986-06-23 | 1988-01-07 | Agency Of Ind Science & Technol | Corerection for deflecting distortion in focused ion beam |
JPS63150842A (en) * | 1986-12-15 | 1988-06-23 | Nichidenshi Tekunikusu:Kk | Scanning electron microscope |
JPH01130458A (en) * | 1987-11-16 | 1989-05-23 | Nichidenshi Tekunikusu:Kk | Distortion correcting device for scanning electron microscope image |
AT394086B (en) * | 1988-03-22 | 1992-01-27 | Roto Frank Eisenwaren | ADJUSTABLE TAPE FOR WINDOW OR DOOR SHUTTERS |
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