JPS5582072A - Measuring method for emitted electron flow angle distribution for electron gun - Google Patents
Measuring method for emitted electron flow angle distribution for electron gunInfo
- Publication number
- JPS5582072A JPS5582072A JP15610878A JP15610878A JPS5582072A JP S5582072 A JPS5582072 A JP S5582072A JP 15610878 A JP15610878 A JP 15610878A JP 15610878 A JP15610878 A JP 15610878A JP S5582072 A JPS5582072 A JP S5582072A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- electron flow
- electron gun
- fed
- gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To enable to measure the angular distribution of electron flow easily, by measuring the beam current through the sequential emission of the electron flow having different emission angle emitted from the electron gun with the two stages of the polarization systems placed between the electron gun and the collective lens to the collective lens.
CONSTITUTION: The electron gun 1 consists of the filament 2, Wehnelt electrode 3 and anode 4. The electron flow from the electron gun 1 is collected with the first and second collection lenses 5, 6, control is made at the power supplies 7, 8, and the excitation of the lens 6 can be interrupted with the switch 9. The electron flow can be detected with the Farady cup 11 on the stage 10, and the signal is fed to the terminal Y of the X-Y recorder 13 via the amplifier 12. The deflection signals S1, S2 are fed to the two stages of the polarization systems 14, 15 from the deflection power supply 18, and a part of the signal S1 is fed to the X terminal of the recorder 13. After image forming the cross over image on the cup 11, the signals S1, S2 are suitably swept to obtain the distribution curve of emission electron flow.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15610878A JPS5842934B2 (en) | 1978-12-15 | 1978-12-15 | Method for measuring the angular distribution of emitted electron flow in an electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15610878A JPS5842934B2 (en) | 1978-12-15 | 1978-12-15 | Method for measuring the angular distribution of emitted electron flow in an electron gun |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5582072A true JPS5582072A (en) | 1980-06-20 |
| JPS5842934B2 JPS5842934B2 (en) | 1983-09-22 |
Family
ID=15620476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15610878A Expired JPS5842934B2 (en) | 1978-12-15 | 1978-12-15 | Method for measuring the angular distribution of emitted electron flow in an electron gun |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5842934B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109444947A (en) * | 2019-01-08 | 2019-03-08 | 中国工程物理研究院激光聚变研究中心 | A kind of X-ray radiation stream diagnostic system |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6091619A (en) * | 1983-10-25 | 1985-05-23 | 松下電器産業株式会社 | Electrolytic condenser |
| JPS6398624U (en) * | 1986-12-18 | 1988-06-25 |
-
1978
- 1978-12-15 JP JP15610878A patent/JPS5842934B2/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109444947A (en) * | 2019-01-08 | 2019-03-08 | 中国工程物理研究院激光聚变研究中心 | A kind of X-ray radiation stream diagnostic system |
| CN109444947B (en) * | 2019-01-08 | 2023-08-18 | 中国工程物理研究院激光聚变研究中心 | X-ray radiation flow diagnosis system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5842934B2 (en) | 1983-09-22 |
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