JPS57111936A - Astigmatism correcting device for electron microscope - Google Patents

Astigmatism correcting device for electron microscope

Info

Publication number
JPS57111936A
JPS57111936A JP18765880A JP18765880A JPS57111936A JP S57111936 A JPS57111936 A JP S57111936A JP 18765880 A JP18765880 A JP 18765880A JP 18765880 A JP18765880 A JP 18765880A JP S57111936 A JPS57111936 A JP S57111936A
Authority
JP
Japan
Prior art keywords
specimen
power source
spinning
deflection
irradiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18765880A
Other languages
Japanese (ja)
Other versions
JPS6231473B2 (en
Inventor
Hisao Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP18765880A priority Critical patent/JPS57111936A/en
Publication of JPS57111936A publication Critical patent/JPS57111936A/en
Publication of JPS6231473B2 publication Critical patent/JPS6231473B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Abstract

PURPOSE:To perform the adjustment of a stake meter accurately and easily even at relatively low magnification by providing means for deflecting the specimen irradiating electron beam such that it will perform the spinning. CONSTITUTION:The power source 11 for the focusing lens systems IL, PL is adjusted to exchange the signal source for supplying to the deflection coils 12, 13 provided above a specimen 3 from normal deflecting power source 15 to a spinning deflection power source 16 through an interlocked exchange switch 14. When the output signal from said power source 16 is supplied to said coils 12, 13 the spinning deflection is performed where the incident direction angle relative to the optical axis is varied continuously while maintaining the specimen irradiating position and the incident angle of the electron beam for irradiating the specimen 3 constant. Consequently the adjustment of the stake meter can be performed accurately and easily.
JP18765880A 1980-12-27 1980-12-27 Astigmatism correcting device for electron microscope Granted JPS57111936A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18765880A JPS57111936A (en) 1980-12-27 1980-12-27 Astigmatism correcting device for electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18765880A JPS57111936A (en) 1980-12-27 1980-12-27 Astigmatism correcting device for electron microscope

Publications (2)

Publication Number Publication Date
JPS57111936A true JPS57111936A (en) 1982-07-12
JPS6231473B2 JPS6231473B2 (en) 1987-07-08

Family

ID=16209924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18765880A Granted JPS57111936A (en) 1980-12-27 1980-12-27 Astigmatism correcting device for electron microscope

Country Status (1)

Country Link
JP (1) JPS57111936A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146192A (en) * 2002-10-24 2004-05-20 Hitachi High-Technologies Corp Test piece observation method by transmission electron microscope
JP2008112748A (en) * 2008-02-04 2008-05-15 Hitachi Ltd Scanning type charged particle microscope, and its astigmatism correcting method
US20140061464A1 (en) * 2012-09-04 2014-03-06 Fei Company Method of Investigating and Correcting Aberrations in a Charged-Particle Lens System

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55121259A (en) * 1979-03-14 1980-09-18 Hitachi Ltd Elelctron microscope

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55121259A (en) * 1979-03-14 1980-09-18 Hitachi Ltd Elelctron microscope

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146192A (en) * 2002-10-24 2004-05-20 Hitachi High-Technologies Corp Test piece observation method by transmission electron microscope
JP2008112748A (en) * 2008-02-04 2008-05-15 Hitachi Ltd Scanning type charged particle microscope, and its astigmatism correcting method
US20140061464A1 (en) * 2012-09-04 2014-03-06 Fei Company Method of Investigating and Correcting Aberrations in a Charged-Particle Lens System
JP2014053304A (en) * 2012-09-04 2014-03-20 Fei Co Method for investigating and correcting aberration in charged particle lens
CN103681188A (en) * 2012-09-04 2014-03-26 Fei公司 Method of investigating and correcting aberrations in charged-particle lens system
US9136087B2 (en) 2012-09-04 2015-09-15 Fei Company Method of investigating and correcting aberrations in a charged-particle lens system

Also Published As

Publication number Publication date
JPS6231473B2 (en) 1987-07-08

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