JPS57130354A - Electronic optical bodytube - Google Patents

Electronic optical bodytube

Info

Publication number
JPS57130354A
JPS57130354A JP1551281A JP1551281A JPS57130354A JP S57130354 A JPS57130354 A JP S57130354A JP 1551281 A JP1551281 A JP 1551281A JP 1551281 A JP1551281 A JP 1551281A JP S57130354 A JPS57130354 A JP S57130354A
Authority
JP
Japan
Prior art keywords
size
electron beam
bodytube
lens
specimen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1551281A
Other languages
Japanese (ja)
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1551281A priority Critical patent/JPS57130354A/en
Publication of JPS57130354A publication Critical patent/JPS57130354A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To easily vary the size of an electron beam on a specimen without changing lens conditions by using two beam forming aperture masks. CONSTITUTION:Electrons emitted from an electron gun 11 are focused by a condenser lens 12, and the electron beam is illuminated toward beam forming aperture masks 1, 2. The aperture mask 2 is fixed inside a bodytube, and the aperture mask 1 is moved by a motor driving mechanism 13 along a line connecting both tops of apertures 1a, 2a. The electron beam formed through each of the apertures 1a, 2a of the aperture masks 1, 2 is illuminated by projection on a specimen 16 through a projection lens 14, deflection plates 15, and an objective lens. The size of the electron beam is detected by a beam size detector 17, then the motor driving mechanism 13 is controlled by a controller 18 in response to this detected signal, thus regulating the beam size automatically.
JP1551281A 1981-02-04 1981-02-04 Electronic optical bodytube Pending JPS57130354A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1551281A JPS57130354A (en) 1981-02-04 1981-02-04 Electronic optical bodytube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1551281A JPS57130354A (en) 1981-02-04 1981-02-04 Electronic optical bodytube

Publications (1)

Publication Number Publication Date
JPS57130354A true JPS57130354A (en) 1982-08-12

Family

ID=11890860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1551281A Pending JPS57130354A (en) 1981-02-04 1981-02-04 Electronic optical bodytube

Country Status (1)

Country Link
JP (1) JPS57130354A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6164054A (en) * 1984-06-19 1986-04-02 テキサス　インスツルメンツ　インコーポレイテツド Charged particle supply device
EP0883157A1 (en) * 1997-04-22 1998-12-09 Schlumberger Technologies, Inc. Optical system with an axially moveable apertured plate
WO2004114314A1 (en) * 2003-06-11 2004-12-29 Matsushita Electric Industrial Co., Ltd. Information storage
JP2020071907A (en) * 2018-10-29 2020-05-07 三菱電機株式会社 Ion implantation device
JP2022542692A (en) * 2019-07-31 2022-10-06 カール ツァイス マルチセム ゲーエムベーハー Particle beam system and its use for flexible setting of current intensity of individual particle beams

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6164054A (en) * 1984-06-19 1986-04-02 テキサス　インスツルメンツ　インコーポレイテツド Charged particle supply device
EP0883157A1 (en) * 1997-04-22 1998-12-09 Schlumberger Technologies, Inc. Optical system with an axially moveable apertured plate
WO2004114314A1 (en) * 2003-06-11 2004-12-29 Matsushita Electric Industrial Co., Ltd. Information storage
US7471542B2 (en) 2003-06-11 2008-12-30 Panasonic Corporation Information storage apparatus storing and reading information by irradiating a storage medium with electron beam
JP2020071907A (en) * 2018-10-29 2020-05-07 三菱電機株式会社 Ion implantation device
JP2022542692A (en) * 2019-07-31 2022-10-06 カール ツァイス マルチセム ゲーエムベーハー Particle beam system and its use for flexible setting of current intensity of individual particle beams

Similar Documents

Publication Publication Date Title
JPS5632655A (en) Electron beam device
JPS5763750A (en) Control picture tube electron gun
JPS55121259A (en) Elelctron microscope
JPS57130354A (en) Electronic optical bodytube
EP0334334A3 (en) Photo-cathode image projection apparatus for patterning a semiconductor device
JPS5727551A (en) Electron microscope
JPS5767912A (en) Axis aligning method of electronic optical lens barrel
JPS5546553A (en) Method of projecting electron beam
GB860557A (en) Improvements in or relating to electron beam discharge apparatus
JPS5533716A (en) Electron microscope focusing lens system
JPS5760648A (en) Electron microscope
JPS5757460A (en) Electron microscope
JPS5610926A (en) Electron beam drawing device
JPS57111936A (en) Astigmatism correcting device for electron microscope
JPS5688246A (en) Electron beam device
JPS56152145A (en) Electron microscope
JPS6476655A (en) Radiation quantity stabilizing device for electron microscope
JPS5772325A (en) Electron beam exposing equipment
JPS56112730A (en) Electron beam drawing apparatus
JPS55146851A (en) Focusing deflector for charged particle beam
JPS5762531A (en) Exposing device by electron beam
JPS63131060U (en)
JPS5538057A (en) Electron beam device
JPS5461879A (en) Electron beam exposure apparatus
JPS574123A (en) Alignment of aperture with opening for passage of rectangular electron beam