JPS5461879A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5461879A
JPS5461879A JP12898177A JP12898177A JPS5461879A JP S5461879 A JPS5461879 A JP S5461879A JP 12898177 A JP12898177 A JP 12898177A JP 12898177 A JP12898177 A JP 12898177A JP S5461879 A JPS5461879 A JP S5461879A
Authority
JP
Japan
Prior art keywords
deflector
focusing lens
lens
angle
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12898177A
Other languages
Japanese (ja)
Other versions
JPS5647694B2 (en
Inventor
Yushi Inagaki
Yasuo Furukawa
Masahiro Okabe
Akio Ito
Toshihiro Ishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12898177A priority Critical patent/JPS5461879A/en
Publication of JPS5461879A publication Critical patent/JPS5461879A/en
Publication of JPS5647694B2 publication Critical patent/JPS5647694B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To decrease the opening of a focusing lens and reduce the aberrations of image plane by providing a beam direction control deflector which makes the direction of an electron beam parallel with the optical axis of the focusing lens to the exit side of a distribution control deflector provided to the beam exposure apparatus.
CONSTITUTION: The electron beam from an electron gun 1 is passed through a focusing lens 2, aperture 3, focusing lens 4, deflector 5, aperture 6, focusing lens 7 and deflector 8 and is radiated onto a sample 9. A beam direction control deflector 10 is newly disposed to the exit side of the deflector 5 of the beam exposure apparatus formed in this way. More specifically, the electron beam 21 is deflected at an angle θ' larger than the angle θ by the deflector 5 to a beam 21', which is further delfected to the inner side of the angle θ' by the deflector 10 and is entered to the specified point of the aperture 6 while being made parallel with the optical axis of the lens 4 as shown by the beam 21". Then, the opening of the lens 7' is made smaller than that of the lens 7 and since the incident angle becomes right angle, the abberations are eliminated.
COPYRIGHT: (C)1979,JPO&Japio
JP12898177A 1977-10-27 1977-10-27 Electron beam exposure apparatus Granted JPS5461879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12898177A JPS5461879A (en) 1977-10-27 1977-10-27 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12898177A JPS5461879A (en) 1977-10-27 1977-10-27 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS5461879A true JPS5461879A (en) 1979-05-18
JPS5647694B2 JPS5647694B2 (en) 1981-11-11

Family

ID=14998164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12898177A Granted JPS5461879A (en) 1977-10-27 1977-10-27 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5461879A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5875746A (en) * 1981-10-30 1983-05-07 Toshiba Corp Optical lens-barrel for changed beam

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764393U (en) * 1980-10-02 1982-04-16

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5875746A (en) * 1981-10-30 1983-05-07 Toshiba Corp Optical lens-barrel for changed beam

Also Published As

Publication number Publication date
JPS5647694B2 (en) 1981-11-11

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