JPS5468150A - Electron ray deflector - Google Patents
Electron ray deflectorInfo
- Publication number
- JPS5468150A JPS5468150A JP13536577A JP13536577A JPS5468150A JP S5468150 A JPS5468150 A JP S5468150A JP 13536577 A JP13536577 A JP 13536577A JP 13536577 A JP13536577 A JP 13536577A JP S5468150 A JPS5468150 A JP S5468150A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- lens
- deflection
- spherical aberration
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To speed up the scanning, by poroviding the deflection system correcting the spherical aberration of the electron lens, in the electron microscope performing angle scanning.
CONSTITUTION: Two stage of deflection systems D1 and D2 are placed at the incident electron ray of the electron lens (objective lens)2 of the electron microscope performing angle scanning. When the electron rays are radiated with an incident angle α to the test piece 1, the electron rays intersect the light axis 3 close to Csα2 with the spherical aberration of the lens 2, where Cs is the coefficient of spherical aberration. Accordingly, when the electron rays are incident to the lens 2 from the point O2 apart from the lens 2 by the distance Δb=Csα2 by means of the deflection system D2, the rays intersect the light axis 3 on the test piece 3 and the position of radiation can be fixed to one point. Further, the deflection components aX and aY of X and Y direction orthogonal to the light axis 3 and the deflection angles θ1X, θ1Y, θ2X and θ2Y are satisfied with a given relation and the deflection systems D1 and D2 are deflected with the circuit generating the signal given the function of aX and aY. Thus, the scanning of high speed can be made without being affected with the spherical aberration.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52135365A JPS5911179B2 (en) | 1977-11-11 | 1977-11-11 | Electron beam deflection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52135365A JPS5911179B2 (en) | 1977-11-11 | 1977-11-11 | Electron beam deflection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5468150A true JPS5468150A (en) | 1979-06-01 |
| JPS5911179B2 JPS5911179B2 (en) | 1984-03-14 |
Family
ID=15150019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52135365A Expired JPS5911179B2 (en) | 1977-11-11 | 1977-11-11 | Electron beam deflection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5911179B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6014739A (en) * | 1983-07-06 | 1985-01-25 | Jeol Ltd | Electron beam diffraction apparatus |
| JPS60105150A (en) * | 1983-11-11 | 1985-06-10 | Jeol Ltd | Electron microscope |
| WO2015045468A1 (en) * | 2013-09-30 | 2015-04-02 | 株式会社日立ハイテクノロジーズ | Charged particle beam device |
| WO2017002243A1 (en) * | 2015-07-01 | 2017-01-05 | 株式会社日立ハイテクノロジーズ | Aberration correction method, aberration correction system, and charged particle beam device |
-
1977
- 1977-11-11 JP JP52135365A patent/JPS5911179B2/en not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6014739A (en) * | 1983-07-06 | 1985-01-25 | Jeol Ltd | Electron beam diffraction apparatus |
| JPS60105150A (en) * | 1983-11-11 | 1985-06-10 | Jeol Ltd | Electron microscope |
| WO2015045468A1 (en) * | 2013-09-30 | 2015-04-02 | 株式会社日立ハイテクノロジーズ | Charged particle beam device |
| JPWO2015045468A1 (en) * | 2013-09-30 | 2017-03-09 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
| JP2018022703A (en) * | 2013-09-30 | 2018-02-08 | 株式会社日立ハイテクノロジーズ | Charged particle beam device |
| US10319558B2 (en) | 2013-09-30 | 2019-06-11 | Hitachi High-Technologies Corporation | Charged particle beam device |
| WO2017002243A1 (en) * | 2015-07-01 | 2017-01-05 | 株式会社日立ハイテクノロジーズ | Aberration correction method, aberration correction system, and charged particle beam device |
| US10446361B2 (en) | 2015-07-01 | 2019-10-15 | Hitachi High-Technologies Corporation | Aberration correction method, aberration correction system, and charged particle beam apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5911179B2 (en) | 1984-03-14 |
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