JPS5452987A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS5452987A JPS5452987A JP11963877A JP11963877A JPS5452987A JP S5452987 A JPS5452987 A JP S5452987A JP 11963877 A JP11963877 A JP 11963877A JP 11963877 A JP11963877 A JP 11963877A JP S5452987 A JPS5452987 A JP S5452987A
- Authority
- JP
- Japan
- Prior art keywords
- deflector
- lens
- giving
- large angle
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To increase the exposure velocity for the exposure device possessing the telecentric deflection system, by providing two units of deflectors before and after the projection lens and giving a high-accuracy function with a large angle to one deflector and giving a high-accuracy function with a large angle to one deflector and giving a high-speed function to the other deflector respectively.
CONSTITUTION: Projection lens 11 is provided as the objective lens. And deflector 12 featuring a high accuracy with a large angle is provided at the focal point of the incidence side of lens 11, and deflector 13 featuring a high speed is provided at the incident side respectively. An electromagnetic deflector is used for deflector 12 with application of the information of about 15W16 bits via the D-A converter in the form of the analog signal; while an electrostatic deflector is used for deflector 13 respectively. In such constitution, exposure filed 14 of the test sample is divided into plural regions 15, and a telecentric deflection is performed through combination of deflector 12 and lens 11 to select the X and Y original points for region 15 as shown by optical path 10 and 10'. Then the beam of path 10' is deflected within region 15 via deflector 13 to secure the irradiation to finer x and y original points
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11963877A JPS5452987A (en) | 1977-10-05 | 1977-10-05 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11963877A JPS5452987A (en) | 1977-10-05 | 1977-10-05 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5452987A true JPS5452987A (en) | 1979-04-25 |
Family
ID=14766394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11963877A Pending JPS5452987A (en) | 1977-10-05 | 1977-10-05 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5452987A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5748434U (en) * | 1980-09-03 | 1982-03-18 | ||
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
JPS586130A (en) * | 1981-07-03 | 1983-01-13 | Fujitsu Ltd | Correcting method for deflection of electron beam |
JPS5811960U (en) * | 1981-07-15 | 1983-01-25 | 株式会社三協精機製作所 | small motor |
JPS58114425A (en) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | Electron beam exposure device |
-
1977
- 1977-10-05 JP JP11963877A patent/JPS5452987A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5748434U (en) * | 1980-09-03 | 1982-03-18 | ||
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
JPS586130A (en) * | 1981-07-03 | 1983-01-13 | Fujitsu Ltd | Correcting method for deflection of electron beam |
JPS5811960U (en) * | 1981-07-15 | 1983-01-25 | 株式会社三協精機製作所 | small motor |
JPS58114425A (en) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | Electron beam exposure device |
JPS6234134B2 (en) * | 1981-12-28 | 1987-07-24 | Fujitsu Ltd |
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