JPS5452987A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5452987A
JPS5452987A JP11963877A JP11963877A JPS5452987A JP S5452987 A JPS5452987 A JP S5452987A JP 11963877 A JP11963877 A JP 11963877A JP 11963877 A JP11963877 A JP 11963877A JP S5452987 A JPS5452987 A JP S5452987A
Authority
JP
Japan
Prior art keywords
deflector
lens
giving
large angle
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11963877A
Other languages
Japanese (ja)
Inventor
Masahiro Okabe
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11963877A priority Critical patent/JPS5452987A/en
Publication of JPS5452987A publication Critical patent/JPS5452987A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To increase the exposure velocity for the exposure device possessing the telecentric deflection system, by providing two units of deflectors before and after the projection lens and giving a high-accuracy function with a large angle to one deflector and giving a high-accuracy function with a large angle to one deflector and giving a high-speed function to the other deflector respectively.
CONSTITUTION: Projection lens 11 is provided as the objective lens. And deflector 12 featuring a high accuracy with a large angle is provided at the focal point of the incidence side of lens 11, and deflector 13 featuring a high speed is provided at the incident side respectively. An electromagnetic deflector is used for deflector 12 with application of the information of about 15W16 bits via the D-A converter in the form of the analog signal; while an electrostatic deflector is used for deflector 13 respectively. In such constitution, exposure filed 14 of the test sample is divided into plural regions 15, and a telecentric deflection is performed through combination of deflector 12 and lens 11 to select the X and Y original points for region 15 as shown by optical path 10 and 10'. Then the beam of path 10' is deflected within region 15 via deflector 13 to secure the irradiation to finer x and y original points
COPYRIGHT: (C)1979,JPO&Japio
JP11963877A 1977-10-05 1977-10-05 Electron beam exposure device Pending JPS5452987A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11963877A JPS5452987A (en) 1977-10-05 1977-10-05 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11963877A JPS5452987A (en) 1977-10-05 1977-10-05 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5452987A true JPS5452987A (en) 1979-04-25

Family

ID=14766394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11963877A Pending JPS5452987A (en) 1977-10-05 1977-10-05 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5452987A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748434U (en) * 1980-09-03 1982-03-18
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS586130A (en) * 1981-07-03 1983-01-13 Fujitsu Ltd Correcting method for deflection of electron beam
JPS5811960U (en) * 1981-07-15 1983-01-25 株式会社三協精機製作所 small motor
JPS58114425A (en) * 1981-12-28 1983-07-07 Fujitsu Ltd Electron beam exposure device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748434U (en) * 1980-09-03 1982-03-18
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS586130A (en) * 1981-07-03 1983-01-13 Fujitsu Ltd Correcting method for deflection of electron beam
JPS5811960U (en) * 1981-07-15 1983-01-25 株式会社三協精機製作所 small motor
JPS58114425A (en) * 1981-12-28 1983-07-07 Fujitsu Ltd Electron beam exposure device
JPS6234134B2 (en) * 1981-12-28 1987-07-24 Fujitsu Ltd

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