JPS5469075A - Electron beam drawing device - Google Patents
Electron beam drawing deviceInfo
- Publication number
- JPS5469075A JPS5469075A JP13572577A JP13572577A JPS5469075A JP S5469075 A JPS5469075 A JP S5469075A JP 13572577 A JP13572577 A JP 13572577A JP 13572577 A JP13572577 A JP 13572577A JP S5469075 A JPS5469075 A JP S5469075A
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- image
- electron beam
- lens
- selecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To ensure the easy-to-adjust exposure with high speed and high accuracy by irradiating the electron beam over the entire surface of the mask containing apertures of different shapes and sizes and then securing the image formation on the irradiation surface through selection of only one transmission beam.
CONSTITUTION: An image formation is given through lens 3 to the electron beam which has passed through aperture 14 in accordance with the shape of the aperture, and selecting aperture 15 is distributed on the image-formation surface. As the image of crossover 1 is at the center of lens 3, the arrangement is given so that the image position may be the deflecting center of the selecting deflection system. As a result, the electron beam does not get out of the optical axis whichever aperture 14 may be chosen on mask 7 through action of deflection system 22. and thus the aperture image is formed on mask 7 on selecting aperture 17 after passing through the center of lens 3. Aperture 14 outside the optical axis has the image formation out of the axis. In this way, system 22 carries out correction for the aperture selection and the axis shift, and furthermore the irradiation switching is possible via system 22 and aperture 15.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13572577A JPS5469075A (en) | 1977-11-14 | 1977-11-14 | Electron beam drawing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13572577A JPS5469075A (en) | 1977-11-14 | 1977-11-14 | Electron beam drawing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5469075A true JPS5469075A (en) | 1979-06-02 |
| JPS6133254B2 JPS6133254B2 (en) | 1986-08-01 |
Family
ID=15158413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13572577A Granted JPS5469075A (en) | 1977-11-14 | 1977-11-14 | Electron beam drawing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5469075A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5712521A (en) * | 1980-06-26 | 1982-01-22 | Nippon Telegr & Teleph Corp <Ntt> | Drawing device of figure by electron beam |
| JPS5731133A (en) * | 1980-08-01 | 1982-02-19 | Hitachi Ltd | Drawing device by electron beam |
| JPS583228A (en) * | 1981-06-30 | 1983-01-10 | Toshiba Corp | Charged beam optical lens-barrel |
| JPS61124129A (en) * | 1984-11-21 | 1986-06-11 | Hitachi Ltd | Electron beam exposure device |
| JPS62286274A (en) * | 1986-06-05 | 1987-12-12 | Toshiba Mach Co Ltd | Electron beam exposure apparatus |
| JPH03119717A (en) * | 1989-09-30 | 1991-05-22 | Fujitsu Ltd | Charged particle exposure device and exposure |
| JP2006128564A (en) * | 2004-11-01 | 2006-05-18 | Toshiba Corp | Charged beam aligner and charged beam control method |
| JP2018190731A (en) * | 2017-05-11 | 2018-11-29 | カール ツァイス マイクロスコーピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ ＧｍｂＨ | Particle source for producing particle beam and particle-optical apparatus |
-
1977
- 1977-11-14 JP JP13572577A patent/JPS5469075A/en active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5712521A (en) * | 1980-06-26 | 1982-01-22 | Nippon Telegr & Teleph Corp <Ntt> | Drawing device of figure by electron beam |
| JPS6235263B2 (en) * | 1980-06-26 | 1987-07-31 | Nippon Telegraph & Telephone | |
| JPS5731133A (en) * | 1980-08-01 | 1982-02-19 | Hitachi Ltd | Drawing device by electron beam |
| JPS583228A (en) * | 1981-06-30 | 1983-01-10 | Toshiba Corp | Charged beam optical lens-barrel |
| JPS61124129A (en) * | 1984-11-21 | 1986-06-11 | Hitachi Ltd | Electron beam exposure device |
| JPS62286274A (en) * | 1986-06-05 | 1987-12-12 | Toshiba Mach Co Ltd | Electron beam exposure apparatus |
| JPH03119717A (en) * | 1989-09-30 | 1991-05-22 | Fujitsu Ltd | Charged particle exposure device and exposure |
| JP2006128564A (en) * | 2004-11-01 | 2006-05-18 | Toshiba Corp | Charged beam aligner and charged beam control method |
| JP2018190731A (en) * | 2017-05-11 | 2018-11-29 | カール ツァイス マイクロスコーピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ ＧｍｂＨ | Particle source for producing particle beam and particle-optical apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6133254B2 (en) | 1986-08-01 |
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