JPS5484484A - Device and method for electron beam exposure - Google Patents

Device and method for electron beam exposure

Info

Publication number
JPS5484484A
JPS5484484A JP15169377A JP15169377A JPS5484484A JP S5484484 A JPS5484484 A JP S5484484A JP 15169377 A JP15169377 A JP 15169377A JP 15169377 A JP15169377 A JP 15169377A JP S5484484 A JPS5484484 A JP S5484484A
Authority
JP
Japan
Prior art keywords
electron beam
deflector
mask
pattern
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15169377A
Other languages
Japanese (ja)
Inventor
Koichi Tatsuno
Taido Uno
Yoshinobu Takeuchi
Mamoru Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15169377A priority Critical patent/JPS5484484A/en
Publication of JPS5484484A publication Critical patent/JPS5484484A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To accelerate an exposure speed, and to make lens aberration smally by allowing a deflector to scan on the entire mask surface part by part after an electron beam from an electron beam source is changed in shape.
CONSTITUTION: An electron beam from electron beam source 2 provided into evacuated mirror cylinder 1 is shaped by stop 3 and deflected by deflector 12 before being caused to strike the mask with perforations similar to a drawn pattern. Beam having passed through those perforations are focused by electron lens 5 and while the pattern image is being formed on the surface of smaple 7 mounted on sample pedestal 8, deflector 12 scans on the entire surface of smaple 7. In this case, the diameter of this beam is set larger than that of the picture element of the pattern formed on mask 9, thereby accelerating the exposure speed greatly. Between mask 9 and sample 7, auxiliary lens 51 for the fine adjustment of the focal distance, stigma meter 52 for removing astigmatism, and auxiliary deflector 53 for correcting distortional aberration are arranged, thereby exposing a pattern with high precision.
COPYRIGHT: (C)1979,JPO&Japio
JP15169377A 1977-12-19 1977-12-19 Device and method for electron beam exposure Pending JPS5484484A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15169377A JPS5484484A (en) 1977-12-19 1977-12-19 Device and method for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15169377A JPS5484484A (en) 1977-12-19 1977-12-19 Device and method for electron beam exposure

Publications (1)

Publication Number Publication Date
JPS5484484A true JPS5484484A (en) 1979-07-05

Family

ID=15524190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15169377A Pending JPS5484484A (en) 1977-12-19 1977-12-19 Device and method for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5484484A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6070726A (en) * 1983-09-26 1985-04-22 Nec Corp Electron beam exposure device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6070726A (en) * 1983-09-26 1985-04-22 Nec Corp Electron beam exposure device

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