JPS5575222A - Electro-optical mirror tube - Google Patents

Electro-optical mirror tube

Info

Publication number
JPS5575222A
JPS5575222A JP14889978A JP14889978A JPS5575222A JP S5575222 A JPS5575222 A JP S5575222A JP 14889978 A JP14889978 A JP 14889978A JP 14889978 A JP14889978 A JP 14889978A JP S5575222 A JPS5575222 A JP S5575222A
Authority
JP
Japan
Prior art keywords
lens
aperture
image
astigmatism
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14889978A
Other languages
Japanese (ja)
Other versions
JPS5842936B2 (en
Inventor
Mamoru Nakasuji
Kanji Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP14889978A priority Critical patent/JPS5842936B2/en
Publication of JPS5575222A publication Critical patent/JPS5575222A/en
Publication of JPS5842936B2 publication Critical patent/JPS5842936B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a high-resolution electron beam by providing an astigmatism- correcting coil for an aperture image in the vicinity of an objective lens, and another astigmatism-correcting coil at the location well apart from a crossover image and between an electron gun and an objective lens.
CONSTITUTION: A crossover image is generated at a point A by an electron beam from an electron gun 1. An aperture image, which is obtained by projecting a Gaussian-distribution electron beam to an aperture 2, is projected to an aperture 5 through a condenser lens 3 and a projection lens 4. Then, after said image has been reduced by a reducing lens 6, it is projected on a specimen 8 by an objective lens 7, thereby an electro-optical mirror tube is constituted. In this constitution, an astigmatism-correction coil 10 is provided between the lens 4 and the aperture 5, and an astigmatism-correction coil 9 is provided directly over the lens 7, thereby the minimum disturbed circle on the main surface of the lens 7 can be reduced and stable high resolution can be obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP14889978A 1978-12-01 1978-12-01 Electron optical lens barrel Expired JPS5842936B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14889978A JPS5842936B2 (en) 1978-12-01 1978-12-01 Electron optical lens barrel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14889978A JPS5842936B2 (en) 1978-12-01 1978-12-01 Electron optical lens barrel

Publications (2)

Publication Number Publication Date
JPS5575222A true JPS5575222A (en) 1980-06-06
JPS5842936B2 JPS5842936B2 (en) 1983-09-22

Family

ID=15463161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14889978A Expired JPS5842936B2 (en) 1978-12-01 1978-12-01 Electron optical lens barrel

Country Status (1)

Country Link
JP (1) JPS5842936B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229937A (en) * 1986-03-31 1987-10-08 Toshiba Corp Electron beam lithography equipment
JPH0877957A (en) * 1994-09-06 1996-03-22 Hitachi Ltd Charged particle projector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229937A (en) * 1986-03-31 1987-10-08 Toshiba Corp Electron beam lithography equipment
JPH0877957A (en) * 1994-09-06 1996-03-22 Hitachi Ltd Charged particle projector

Also Published As

Publication number Publication date
JPS5842936B2 (en) 1983-09-22

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