JPS6028137Y2 - Electron beam exposure equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam exposure apparatus, and more particularly to an electron beam exposure apparatus that shapes an electron beam into a desired shape for exposure.

When exposing using an electron beam, the methods that are generally used include raster scanning with the electron beam and exposing only the desired area, but since a spot-shaped electron beam is used, The exposure time becomes longer.

Therefore, the present inventors first proposed an exposure apparatus that shapes an electron beam into a rectangular shape for exposure.

Its configuration is shown in FIG.

The electron beam from the electron gun 1 is focused by the first, second and third electron lenses 2, 3.4 and irradiated onto the first slit 5.

The first slit has a rectangular hole 5a as shown in FIG. 61, and the electron beam passing through the hole 5a becomes rectangular as shown in FIG.

The rectangular electron beam is deflected by a deflector 6 and projected onto a second slit 7.

At this time, when the hole 7a of the slit 7 is irradiated with an electron beam as shown in Figure d, the portion where the hole 7a and the electron beam overlap passes through.

The electron beam that has passed is reduced by a reduction lens 8 and is irradiated onto a sample 10 on a stage 9.

If a rectangular electron beam is used in this way, the area that can be exposed at one time becomes larger, so that the exposure time can be shortened.

However, conventionally, a thermionic emission type electron gun is used as the electron gun 1, so it cannot be used as a point light source.

For this reason, the image of the electron beam passing through the first slit 5 becomes blurred, so an image forming lens 11 is used to form the image of the electron beam onto the second slit 7.

When this imaging lens 11 is used, the image rotates, so the second slit 7 must be rotated relative to the first slit 5 by the amount of rotation of the image, but it is necessary to adjust the rotation angle. It takes time and effort.

Furthermore, the second slit 7 must be placed on the focal point of the imaging lens 11, but this alignment is difficult.

The purpose of the present invention is to eliminate such drawbacks, and the purpose is to provide an electron beam exposure apparatus in which an electron beam from an electron gun is shaped into a desired shape by a plurality of slits for exposure. , is distantly related to an electron beam exposure apparatus characterized in that a field emission electron gun is used as the electron gun.

In the present invention, a field emission electron gun is used as the electron gun so that there is no need to use an imaging lens.

The field emission electron gun, as shown in Figure 2,
A high voltage is applied between the cathode 12, which has an acute tip, and the anode 13, which has a hole 13a, to form an electric field, and this electric field draws out electrons.

The area where the electrons are emitted is about 30A wide at the tip of the cathode, so it can be seen as a point light source.

Therefore, since the electron beam from the electron gun appears to be sufficiently parallel, the image of the electron beam passing through the first slit becomes clear, eliminating the need for an imaging lens.

FIG. 3 shows the overall configuration using this field emission electron gun.

As shown in the figure, the electron beam from the field emission electron gun 12 is focused by the electron lenses 2, 3.4,
The first slit 5 and the second slit 7 are irradiated.

At this time, the electron beam is deflected by the deflector 15 and the first
, the desired portions of the second slits 5 and 7 are irradiated.

Thereby, the electron beam is shaped and the sample 10 is irradiated and exposed.

As described above, according to the present invention, since the imaging lens between the slits can be removed, the arrangement of the first slit and the second slit is facilitated, and the distance between the first and second slits can be reduced. , it becomes possible to downsize the device.

[Brief explanation of drawings]

FIG. 1 is a diagram showing the previously proposed exposure apparatus, FIG. 2 is a diagram showing a field emission electron gun, and FIG. 3 is a diagram showing the exposure apparatus of the present invention. In the figure, 1 is an electron gun, 2, 3, 4 are first, second, and third electron lenses, 5 is a first slit, 6 is a deflector, 7 is a second slit, 8 is a reduction lens, and 9 is a stage. , 10 is the sample, 11
is an imaging lens, 12 is a cathode, and 13 is an anode.

Claims (1)

[Scope of utility model registration request] In an electron beam exposure apparatus in which an electron beam from an electron gun is shaped into a desired shape by a plurality of slits for exposure, a field emission electron gun is used as the electron gun, and the plurality of slits are arranged close to each other. An electron beam exposure device characterized in that it is configured to: