JPS5546553A - Method of projecting electron beam - Google Patents

Method of projecting electron beam

Info

Publication number
JPS5546553A
JPS5546553A JP12017478A JP12017478A JPS5546553A JP S5546553 A JPS5546553 A JP S5546553A JP 12017478 A JP12017478 A JP 12017478A JP 12017478 A JP12017478 A JP 12017478A JP S5546553 A JPS5546553 A JP S5546553A
Authority
JP
Japan
Prior art keywords
converter
memory
circuit
electron beam
deflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12017478A
Other languages
Japanese (ja)
Inventor
Tadashi Nakamura
Hideo Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12017478A priority Critical patent/JPS5546553A/en
Publication of JPS5546553A publication Critical patent/JPS5546553A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To precisely and rapidly project electron beam by enhancing the current density corresponding to allowable blur amount specified in response to the size, shape and area of the beam. CONSTITUTION:Electron beam projected from an electron gun is turned ON or OFF by electrodes 4, and variously shaped through slits 5, deflectors 6, lens 7 and slits 8. The beam thus shaped is determined at its half angle via an aperture 9, and focused through a lens 10 and a deflector 11 on a specimen 12. The positions of the respective unit exposures of the beams are deflected by the deflector 11 through a DA converter 14 and a circuit 15 from the specified information of a memory 18. The size and shape of the beam is set by specifying a memory 16 and deflecting the beam by the deflector 6 via a DA converter 17 and a circuit 18. The exposure time is set by specifying a memory 19 to drive the electrodes 4 via a DA converter 20 and a circuit 21. Beam current density is set by specifying a memory 22 and altering the bias of a Wehnelt cylinder 2 via a DA converter 23 and a circuit 24. Thus, it can precisely and rapidly project electron beam.
JP12017478A 1978-09-28 1978-09-28 Method of projecting electron beam Pending JPS5546553A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12017478A JPS5546553A (en) 1978-09-28 1978-09-28 Method of projecting electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12017478A JPS5546553A (en) 1978-09-28 1978-09-28 Method of projecting electron beam

Publications (1)

Publication Number Publication Date
JPS5546553A true JPS5546553A (en) 1980-04-01

Family

ID=14779744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12017478A Pending JPS5546553A (en) 1978-09-28 1978-09-28 Method of projecting electron beam

Country Status (1)

Country Link
JP (1) JPS5546553A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57124435A (en) * 1981-01-27 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Method for electron beam exposure
JPS5968889U (en) * 1982-10-30 1984-05-10 株式会社荏原製作所 Piping bite joint
JPS60123482U (en) * 1984-01-30 1985-08-20 株式会社トーキン pipe fittings
JPS6184292U (en) * 1984-11-07 1986-06-03
EP0421695A2 (en) * 1989-09-30 1991-04-10 Fujitsu Limited Electron beam exposuring device and exposuring method using the same
US7485879B2 (en) 2005-07-04 2009-02-03 Nuflare Technology, Inc. Electron beam writing apparatus and writing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54127682A (en) * 1978-03-28 1979-10-03 Jeol Ltd Electron beam exposure method
JPS54148381A (en) * 1978-05-12 1979-11-20 Fujitsu Ltd Electron beam exposure method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54127682A (en) * 1978-03-28 1979-10-03 Jeol Ltd Electron beam exposure method
JPS54148381A (en) * 1978-05-12 1979-11-20 Fujitsu Ltd Electron beam exposure method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57124435A (en) * 1981-01-27 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Method for electron beam exposure
JPS5968889U (en) * 1982-10-30 1984-05-10 株式会社荏原製作所 Piping bite joint
JPS6316951Y2 (en) * 1982-10-30 1988-05-13
JPS60123482U (en) * 1984-01-30 1985-08-20 株式会社トーキン pipe fittings
JPH0342297Y2 (en) * 1984-01-30 1991-09-04
JPS6184292U (en) * 1984-11-07 1986-06-03
JPH0240384Y2 (en) * 1984-11-07 1990-10-29
EP0421695A2 (en) * 1989-09-30 1991-04-10 Fujitsu Limited Electron beam exposuring device and exposuring method using the same
US7485879B2 (en) 2005-07-04 2009-02-03 Nuflare Technology, Inc. Electron beam writing apparatus and writing method
DE102006030837B4 (en) * 2005-07-04 2013-03-07 Nuflare Technology, Inc. Electron beam writing method

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