JPS5587433A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5587433A
JPS5587433A JP16315278A JP16315278A JPS5587433A JP S5587433 A JPS5587433 A JP S5587433A JP 16315278 A JP16315278 A JP 16315278A JP 16315278 A JP16315278 A JP 16315278A JP S5587433 A JPS5587433 A JP S5587433A
Authority
JP
Japan
Prior art keywords
aperture
edges
deflector
sample
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16315278A
Other languages
Japanese (ja)
Other versions
JPS6129137B2 (en
Inventor
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16315278A priority Critical patent/JPS5587433A/en
Publication of JPS5587433A publication Critical patent/JPS5587433A/en
Publication of JPS6129137B2 publication Critical patent/JPS6129137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To project on a sample a rectangular beam image having a most adequately adjusted current density, by arbitrarily changing a spot size of beam with a zoom lens mechanism when forming a cross-over image with beam shaping apertures. CONSTITUTION:A deflector 4 is disposed between an electron gun 1 and an exposure sample 13 via a zoom lens mechanism 3 consisting of electron lenses 2a-2c. A lens 7 is disposed under the deflector 4 via a first aperture 6 having two orthogonal edges 5. Under the lens 7, a deflector 8 and a second aperture 10 having orthogonal edges 9 are provided. Between the second aperture 10 and a sample 13, a deflector 12 is provided via three electron beam condensing lenses 11a-11c. A beam image is formed on the aperture 6 by the zoom mechanism 3 of the above-described structure to obtain a rectangular pattern restricted by the edges 5. The beam is further turned to a desired size of a rectangular pattern by the edges 9 of the aperture 10. The spot size of beam is changed by these two pairs of edges 5, 9 to project a beam image of a predetermined current density on the sample 13.
JP16315278A 1978-12-26 1978-12-26 Electron beam exposure device Granted JPS5587433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16315278A JPS5587433A (en) 1978-12-26 1978-12-26 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16315278A JPS5587433A (en) 1978-12-26 1978-12-26 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5587433A true JPS5587433A (en) 1980-07-02
JPS6129137B2 JPS6129137B2 (en) 1986-07-04

Family

ID=15768204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16315278A Granted JPS5587433A (en) 1978-12-26 1978-12-26 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5587433A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712680A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5712673A (en) * 1980-06-27 1982-01-22 Nec Corp Serial printer
JPS5712668A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5762531A (en) * 1980-10-02 1982-04-15 Fujitsu Ltd Exposing device by electron beam
JPS58100427A (en) * 1981-12-10 1983-06-15 Jeol Ltd Projection of charged particle beam

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712680A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5712673A (en) * 1980-06-27 1982-01-22 Nec Corp Serial printer
JPS5712668A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS6330150B2 (en) * 1980-06-27 1988-06-16 Nippon Electric Co
JPS6353036B2 (en) * 1980-06-27 1988-10-20 Nippon Electric Co
JPS5762531A (en) * 1980-10-02 1982-04-15 Fujitsu Ltd Exposing device by electron beam
JPS58100427A (en) * 1981-12-10 1983-06-15 Jeol Ltd Projection of charged particle beam

Also Published As

Publication number Publication date
JPS6129137B2 (en) 1986-07-04

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