JPS5543809A - Electron beam radiating device - Google Patents

Electron beam radiating device

Info

Publication number
JPS5543809A
JPS5543809A JP11518278A JP11518278A JPS5543809A JP S5543809 A JPS5543809 A JP S5543809A JP 11518278 A JP11518278 A JP 11518278A JP 11518278 A JP11518278 A JP 11518278A JP S5543809 A JPS5543809 A JP S5543809A
Authority
JP
Japan
Prior art keywords
lens
electronic beam
focusing
electronic
crossover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11518278A
Other languages
Japanese (ja)
Other versions
JPS5653209B2 (en
Inventor
Yoshinobu Takeuchi
Kiichi Takamoto
Korehito Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP11518278A priority Critical patent/JPS5543809A/en
Publication of JPS5543809A publication Critical patent/JPS5543809A/en
Publication of JPS5653209B2 publication Critical patent/JPS5653209B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enalbe an electronic beam radiating device to be utilized for a solid forming beam and a Gaussian spot by providing in a position in fornt of a radiating lens a lens designed capable of being switched either to transmission of electronic beam or focusing of the same. CONSTITUTION:Provided in a position in front of a radiating lens 11 is an electrostatic lens 6 designed capable of being switched to either transmission or focusing of electronic beam having made a crossover image 5 in the center of a blanking board 4 by a condenser lens 3 with electronic beam radiated from a crossover 2 made by an electronic gun 1. The figure demonstrates utilization of Guassian spot which focusing an electronic beam, makes a crossover image 16 in the center of a forming slit 7 and forms an image on a base board provided on the bottom.
JP11518278A 1978-09-21 1978-09-21 Electron beam radiating device Granted JPS5543809A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11518278A JPS5543809A (en) 1978-09-21 1978-09-21 Electron beam radiating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11518278A JPS5543809A (en) 1978-09-21 1978-09-21 Electron beam radiating device

Publications (2)

Publication Number Publication Date
JPS5543809A true JPS5543809A (en) 1980-03-27
JPS5653209B2 JPS5653209B2 (en) 1981-12-17

Family

ID=14656377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11518278A Granted JPS5543809A (en) 1978-09-21 1978-09-21 Electron beam radiating device

Country Status (1)

Country Link
JP (1) JPS5543809A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002093698A (en) * 2000-07-14 2002-03-29 Leo Elektronenmikroskopie Gmbh Method and system for electron-beam lithography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002093698A (en) * 2000-07-14 2002-03-29 Leo Elektronenmikroskopie Gmbh Method and system for electron-beam lithography

Also Published As

Publication number Publication date
JPS5653209B2 (en) 1981-12-17

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