JPS5562730A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5562730A
JPS5562730A JP13445278A JP13445278A JPS5562730A JP S5562730 A JPS5562730 A JP S5562730A JP 13445278 A JP13445278 A JP 13445278A JP 13445278 A JP13445278 A JP 13445278A JP S5562730 A JPS5562730 A JP S5562730A
Authority
JP
Japan
Prior art keywords
electron beam
deflecting
plate
circuits
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13445278A
Other languages
Japanese (ja)
Other versions
JPS6238851B2 (en
Inventor
Kakuki Motoyama
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13445278A priority Critical patent/JPS5562730A/en
Publication of JPS5562730A publication Critical patent/JPS5562730A/en
Publication of JPS6238851B2 publication Critical patent/JPS6238851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable to draw even a picture of 2mum or less by connecting a modulation circuit that controls electron beam current to a blanking plate that makes up the exposure device and connecting a deflecting circuit for positioning the electron beam to a deflecting plate and by controlling these by means of a computer and an interface. CONSTITUTION:Electron beam from the electron gun 501 is accelerated by the anode 502, converged by the first condenser lens 503, and is done by the second condenser lens 505 through the blanking plate 504. Next the electron beam is defected by the deflecting plate 506, and is applied to the sample 10 through the object lens 507. In this constitution, the blanking plate 504 is connected to the modulation circuit 508 that controls electron beam current, and the deflecting plate 506 is done to the deflecting circuit 509 that positions the electron beam. Also both the circuits 508, 509 are connected to each other with a connection 512, the interface 510 is provided between both the circuits 508, 509 and the computer 511 that controls said circuits 508, 509.
JP13445278A 1978-11-02 1978-11-02 Electron beam exposure device Granted JPS5562730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13445278A JPS5562730A (en) 1978-11-02 1978-11-02 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13445278A JPS5562730A (en) 1978-11-02 1978-11-02 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5562730A true JPS5562730A (en) 1980-05-12
JPS6238851B2 JPS6238851B2 (en) 1987-08-20

Family

ID=15128665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13445278A Granted JPS5562730A (en) 1978-11-02 1978-11-02 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5562730A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
JPS5996728A (en) * 1982-11-25 1984-06-04 Fujitsu Ltd Method for formation of resist pattern

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5322375A (en) * 1976-08-13 1978-03-01 Jeol Ltd Beam blanking device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5322375A (en) * 1976-08-13 1978-03-01 Jeol Ltd Beam blanking device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
JPS5996728A (en) * 1982-11-25 1984-06-04 Fujitsu Ltd Method for formation of resist pattern
JPH0568848B2 (en) * 1982-11-25 1993-09-29 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS6238851B2 (en) 1987-08-20

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