JPS5322375A - Beam blanking device - Google Patents
Beam blanking deviceInfo
- Publication number
- JPS5322375A JPS5322375A JP9686476A JP9686476A JPS5322375A JP S5322375 A JPS5322375 A JP S5322375A JP 9686476 A JP9686476 A JP 9686476A JP 9686476 A JP9686476 A JP 9686476A JP S5322375 A JPS5322375 A JP S5322375A
- Authority
- JP
- Japan
- Prior art keywords
- blanking device
- beam blanking
- providing
- deflecting
- blanking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE: To prevent the beam movement at blanking by providing two deflecting means between a beam receiver and a charged corpuscular ray source and providing a fixed proportional relation between both deflecting angles.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9686476A JPS5322375A (en) | 1976-08-13 | 1976-08-13 | Beam blanking device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9686476A JPS5322375A (en) | 1976-08-13 | 1976-08-13 | Beam blanking device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5322375A true JPS5322375A (en) | 1978-03-01 |
JPS562785B2 JPS562785B2 (en) | 1981-01-21 |
Family
ID=14176305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9686476A Granted JPS5322375A (en) | 1976-08-13 | 1976-08-13 | Beam blanking device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5322375A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5562730A (en) * | 1978-11-02 | 1980-05-12 | Toshiba Corp | Electron beam exposure device |
JPS57122518A (en) * | 1981-01-22 | 1982-07-30 | Toshiba Corp | Electro-optical body tube |
JPS58137947A (en) * | 1982-02-10 | 1983-08-16 | Toshiba Corp | Electronic optical mirror tube |
JPS6251218A (en) * | 1985-08-30 | 1987-03-05 | Hitachi Ltd | Electron beam lithography equipment |
US4684809A (en) * | 1984-09-29 | 1987-08-04 | Kabushiki Kaisha Toshiba | Method of adjusting optical column in energy beam exposure system |
-
1976
- 1976-08-13 JP JP9686476A patent/JPS5322375A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5562730A (en) * | 1978-11-02 | 1980-05-12 | Toshiba Corp | Electron beam exposure device |
JPS6238851B2 (en) * | 1978-11-02 | 1987-08-20 | Tokyo Shibaura Electric Co | |
JPS57122518A (en) * | 1981-01-22 | 1982-07-30 | Toshiba Corp | Electro-optical body tube |
JPS58137947A (en) * | 1982-02-10 | 1983-08-16 | Toshiba Corp | Electronic optical mirror tube |
JPH0568847B2 (en) * | 1982-02-10 | 1993-09-29 | Toshiba Kk | |
US4684809A (en) * | 1984-09-29 | 1987-08-04 | Kabushiki Kaisha Toshiba | Method of adjusting optical column in energy beam exposure system |
JPS6251218A (en) * | 1985-08-30 | 1987-03-05 | Hitachi Ltd | Electron beam lithography equipment |
JPH0587014B2 (en) * | 1985-08-30 | 1993-12-15 | Hitachi Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS562785B2 (en) | 1981-01-21 |
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