JPS52141180A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS52141180A
JPS52141180A JP5819476A JP5819476A JPS52141180A JP S52141180 A JPS52141180 A JP S52141180A JP 5819476 A JP5819476 A JP 5819476A JP 5819476 A JP5819476 A JP 5819476A JP S52141180 A JPS52141180 A JP S52141180A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
disposing
wires
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5819476A
Other languages
Japanese (ja)
Other versions
JPS5921164B2 (en
Inventor
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP51058194A priority Critical patent/JPS5921164B2/en
Publication of JPS52141180A publication Critical patent/JPS52141180A/en
Publication of JPS5921164B2 publication Critical patent/JPS5921164B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To make possible high-speed high-accuracy exposure by disposing an electron beam deflector which comprises stretching plural W wires with mutually equal spaces and insulation within the frame of a square-shaped frame unit, between an electron gun and a projection lens and selectively applying positive and negative voltage thereto.
JP51058194A 1976-05-20 1976-05-20 Electron beam exposure equipment Expired JPS5921164B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51058194A JPS5921164B2 (en) 1976-05-20 1976-05-20 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51058194A JPS5921164B2 (en) 1976-05-20 1976-05-20 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS52141180A true JPS52141180A (en) 1977-11-25
JPS5921164B2 JPS5921164B2 (en) 1984-05-18

Family

ID=13077204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51058194A Expired JPS5921164B2 (en) 1976-05-20 1976-05-20 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5921164B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117387A (en) * 1977-03-23 1978-10-13 Western Electric Co Method of forming high resolution fine pattern at high speed
JPS5435863U (en) * 1977-08-17 1979-03-08
JPS5844717A (en) * 1981-09-11 1983-03-15 Nippon Telegr & Teleph Corp <Ntt> Exposure device by charged beam

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117387A (en) * 1977-03-23 1978-10-13 Western Electric Co Method of forming high resolution fine pattern at high speed
JPS5435863U (en) * 1977-08-17 1979-03-08
JPS5429744Y2 (en) * 1977-08-17 1979-09-20
JPS5844717A (en) * 1981-09-11 1983-03-15 Nippon Telegr & Teleph Corp <Ntt> Exposure device by charged beam
JPS6222261B2 (en) * 1981-09-11 1987-05-16 Nippon Telegraph & Telephone

Also Published As

Publication number Publication date
JPS5921164B2 (en) 1984-05-18

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