JPS54127682A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS54127682A
JPS54127682A JP3573378A JP3573378A JPS54127682A JP S54127682 A JPS54127682 A JP S54127682A JP 3573378 A JP3573378 A JP 3573378A JP 3573378 A JP3573378 A JP 3573378A JP S54127682 A JPS54127682 A JP S54127682A
Authority
JP
Japan
Prior art keywords
electron beam
shape
cross
designation signal
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3573378A
Other languages
Japanese (ja)
Other versions
JPS5649446B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Sakae Miyauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP3573378A priority Critical patent/JPS54127682A/en
Publication of JPS54127682A publication Critical patent/JPS54127682A/en
Publication of JPS5649446B2 publication Critical patent/JPS5649446B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To realize an electron beam exposure method with which a uniform electron beam intensity distribution is ensured within the cross-section of the electron beam on the exposed material and with the reduced exposure time. CONSTITUTION:Electron beam EB0 generated from electron gun 1 is irradiated via condenser lens 2 onto cross-section shape varying means 3 comprising 1st mask m1, 2nd mask m2, X direction deflector dx and Y direction deflector dy respectively. Electron beam EB2 the cross-section of with the desired shape and size given is projected through projection lens 4 onto the exposed material 5 in reduction, and at the same time scanned on the material via the scanning deflector. Digital computer 7, memorizing previously the data of the pattern to be exposed, produces the shape and position designation signal based on the data memorized. And the shape designation signal and the position designation signal are supplied to dx and dy as well as to 6x and 6y via D-A converters 8x, 8y, 9x and 9y as well as amplifiers 10x, 10y, 11x and 11y respectively.
JP3573378A 1978-03-28 1978-03-28 Electron beam exposure method Granted JPS54127682A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3573378A JPS54127682A (en) 1978-03-28 1978-03-28 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3573378A JPS54127682A (en) 1978-03-28 1978-03-28 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS54127682A true JPS54127682A (en) 1979-10-03
JPS5649446B2 JPS5649446B2 (en) 1981-11-21

Family

ID=12450025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3573378A Granted JPS54127682A (en) 1978-03-28 1978-03-28 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS54127682A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546553A (en) * 1978-09-28 1980-04-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Method of projecting electron beam
US4560878A (en) * 1980-05-19 1985-12-24 Hughes Aircraft Company Electron and ion beam-shaping apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6246996Y2 (en) * 1984-11-22 1987-12-23

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546553A (en) * 1978-09-28 1980-04-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Method of projecting electron beam
US4560878A (en) * 1980-05-19 1985-12-24 Hughes Aircraft Company Electron and ion beam-shaping apparatus

Also Published As

Publication number Publication date
JPS5649446B2 (en) 1981-11-21

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