JPS53120379A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS53120379A
JPS53120379A JP3569277A JP3569277A JPS53120379A JP S53120379 A JPS53120379 A JP S53120379A JP 3569277 A JP3569277 A JP 3569277A JP 3569277 A JP3569277 A JP 3569277A JP S53120379 A JPS53120379 A JP S53120379A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
gaussion
regulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3569277A
Other languages
Japanese (ja)
Other versions
JPS603773B2 (en
Inventor
Mamoru Nakasuji
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP52035692A priority Critical patent/JPS603773B2/en
Publication of JPS53120379A publication Critical patent/JPS53120379A/en
Publication of JPS603773B2 publication Critical patent/JPS603773B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To even the electron beam radiation dose of patterns having undergone raster scanning and reduce the occurrence of pattern edge roughness by regulating the diameter of the electron beam having a section of Gaussion function type.
COPYRIGHT: (C)1978,JPO&Japio
JP52035692A 1977-03-30 1977-03-30 Electron beam exposure equipment Expired JPS603773B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52035692A JPS603773B2 (en) 1977-03-30 1977-03-30 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52035692A JPS603773B2 (en) 1977-03-30 1977-03-30 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS53120379A true JPS53120379A (en) 1978-10-20
JPS603773B2 JPS603773B2 (en) 1985-01-30

Family

ID=12448943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52035692A Expired JPS603773B2 (en) 1977-03-30 1977-03-30 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS603773B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0653103A1 (en) * 1993-05-28 1995-05-17 Etec Systems, Inc. Dose modulation and pixel deflection for raster scan lithography

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0295688A (en) * 1988-09-29 1990-04-06 Toshiba Corp Crime prevention device for elevator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0653103A1 (en) * 1993-05-28 1995-05-17 Etec Systems, Inc. Dose modulation and pixel deflection for raster scan lithography
EP0653103A4 (en) * 1993-05-28 1998-12-16 Etec Systems Inc Dose modulation and pixel deflection for raster scan lithography.

Also Published As

Publication number Publication date
JPS603773B2 (en) 1985-01-30

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