JPS5772325A - Electron beam exposing equipment - Google Patents

Electron beam exposing equipment

Info

Publication number
JPS5772325A
JPS5772325A JP14869380A JP14869380A JPS5772325A JP S5772325 A JPS5772325 A JP S5772325A JP 14869380 A JP14869380 A JP 14869380A JP 14869380 A JP14869380 A JP 14869380A JP S5772325 A JPS5772325 A JP S5772325A
Authority
JP
Japan
Prior art keywords
electron beam
aperture
image
deviation
dimensions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14869380A
Other languages
Japanese (ja)
Other versions
JPS6214091B2 (en
Inventor
Mamoru Nakasuji
Kanji Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14869380A priority Critical patent/JPS5772325A/en
Priority to US06/309,780 priority patent/US4543512A/en
Priority to EP81108089A priority patent/EP0049872B1/en
Priority to DE8181108089T priority patent/DE3172441D1/en
Priority to DD81234113A priority patent/DD201953A5/en
Publication of JPS5772325A publication Critical patent/JPS5772325A/en
Publication of JPS6214091B2 publication Critical patent/JPS6214091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Abstract

PURPOSE:To obtain a highly accurate and highly reliable electron beam whose form and dimensions are controlled, by a method wherein a discrepancy of an axial direction of a cross-over of an electron beam is detected and compensated. CONSTITUTION:An aperture image of an electron beam formed by the first beam forming aperture 3 is deflected and projected on the second beam forming aperture 6 and an electron beam with variable dimensions is obtained by superposing the first aperture image and the second aperture image. When the larger dimension and the shorten dimension of the electron beam are variably controlled, a deviation of an edge image regulated by the second aperture 6 is previously measured. The focus distance is adjusted by changing a driving current of a condensor lense 2 according to the deviation and the position of the cross over image is always kept at the center of a light polarizing system 4 by negative feedback control.
JP14869380A 1980-10-15 1980-10-23 Electron beam exposing equipment Granted JPS5772325A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP14869380A JPS5772325A (en) 1980-10-23 1980-10-23 Electron beam exposing equipment
US06/309,780 US4543512A (en) 1980-10-15 1981-10-08 Electron beam exposure system
EP81108089A EP0049872B1 (en) 1980-10-15 1981-10-08 Electron beam exposure system
DE8181108089T DE3172441D1 (en) 1980-10-15 1981-10-08 Electron beam exposure system
DD81234113A DD201953A5 (en) 1980-10-15 1981-10-15 ELECTRON EXPOSURE SYSTEM

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14869380A JPS5772325A (en) 1980-10-23 1980-10-23 Electron beam exposing equipment

Publications (2)

Publication Number Publication Date
JPS5772325A true JPS5772325A (en) 1982-05-06
JPS6214091B2 JPS6214091B2 (en) 1987-03-31

Family

ID=15458481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14869380A Granted JPS5772325A (en) 1980-10-15 1980-10-23 Electron beam exposing equipment

Country Status (1)

Country Link
JP (1) JPS5772325A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60740A (en) * 1983-06-17 1985-01-05 Toshiba Corp Method for controlling charged beam

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118336A (en) * 1980-02-22 1981-09-17 Hitachi Ltd Electron beam lithography

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118336A (en) * 1980-02-22 1981-09-17 Hitachi Ltd Electron beam lithography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60740A (en) * 1983-06-17 1985-01-05 Toshiba Corp Method for controlling charged beam

Also Published As

Publication number Publication date
JPS6214091B2 (en) 1987-03-31

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