JPS5691422A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5691422A
JPS5691422A JP16811679A JP16811679A JPS5691422A JP S5691422 A JPS5691422 A JP S5691422A JP 16811679 A JP16811679 A JP 16811679A JP 16811679 A JP16811679 A JP 16811679A JP S5691422 A JPS5691422 A JP S5691422A
Authority
JP
Japan
Prior art keywords
aperture
blanking
deflector
exposure device
beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16811679A
Other languages
Japanese (ja)
Inventor
Akio Ito
Masahiro Okabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16811679A priority Critical patent/JPS5691422A/en
Publication of JPS5691422A publication Critical patent/JPS5691422A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the positional deviation and the dimensional variation of electron beams by providing the first blanking deflector above the blanking aperture of the electron beam exposure device of a variable rectangular system and providing the second blanking deflector under the blanking aperture. CONSTITUTION:In the electron beam exposure device of a variable rectangular system consisting of the first aperture 4, a blanking aperture 7, a beam form controlling deflector 9, the second aperture 10, an objective aperture 11, a deflector 12, an objective electron lens 13 and a specimen face 14, the first blanking deflector 5 is provided between the first aperture 4 and the blanking aperture 7, and the second blanking deflector 8 is provided between the blanking aperture 7 and the second aperture 10. By providing this second blanking deflector 8, electron beams which passed the aperture 7 are deflected in the opposite direction so that the positional deviation of the elecron beams and the dimensional change of the beams may be prevented.
JP16811679A 1979-12-26 1979-12-26 Electron beam exposure device Pending JPS5691422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16811679A JPS5691422A (en) 1979-12-26 1979-12-26 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16811679A JPS5691422A (en) 1979-12-26 1979-12-26 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5691422A true JPS5691422A (en) 1981-07-24

Family

ID=15862142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16811679A Pending JPS5691422A (en) 1979-12-26 1979-12-26 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5691422A (en)

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