JPS5759108A - Mark position detecting method for electron beam exposure - Google Patents

Mark position detecting method for electron beam exposure

Info

Publication number
JPS5759108A
JPS5759108A JP13388780A JP13388780A JPS5759108A JP S5759108 A JPS5759108 A JP S5759108A JP 13388780 A JP13388780 A JP 13388780A JP 13388780 A JP13388780 A JP 13388780A JP S5759108 A JPS5759108 A JP S5759108A
Authority
JP
Japan
Prior art keywords
circuit
signal
peak
sent
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13388780A
Other languages
Japanese (ja)
Inventor
Eitaro Enokido
Masaru Ohashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP13388780A priority Critical patent/JPS5759108A/en
Publication of JPS5759108A publication Critical patent/JPS5759108A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Measurement Of Radiation (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To achieve high-precision position detection by storing the peak values of two detection signals obtained by scanning a mark appended to a holder in the opposite direction by turns with an electron beam, and by sending a constant peak signal to a signal processing circuit by performing amplification according to the peak values. CONSTITUTION:A scanning signal is sent from a scanning-signal generating circuit 18 to a deflection electrode 4 to scan a mark 1 in opposite directions by turns. A peak signal is obtained from a subtracting circuit 7 through detectors 5a and 5b and amplifiers 6a and 6b. The output is inputted to a level setting circuit 17 through an absolute-valve circuit 13, a peak holding circuit 14, and sample holding circuits 15 and 16. A gain control signal is sent from the level setting circuit 17 to a multi- plying circuit 10 to exercise gain control on the basis of the output peak value of the subtractor 7, and a signal having a constant-level peak value is sent from the multiplying circuit 10 to a signal processing circuit 8. Consequently, mark position detection is performed with high precision.
JP13388780A 1980-09-26 1980-09-26 Mark position detecting method for electron beam exposure Pending JPS5759108A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13388780A JPS5759108A (en) 1980-09-26 1980-09-26 Mark position detecting method for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13388780A JPS5759108A (en) 1980-09-26 1980-09-26 Mark position detecting method for electron beam exposure

Publications (1)

Publication Number Publication Date
JPS5759108A true JPS5759108A (en) 1982-04-09

Family

ID=15115410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13388780A Pending JPS5759108A (en) 1980-09-26 1980-09-26 Mark position detecting method for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5759108A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120024509A1 (en) * 2009-04-22 2012-02-02 Madoka Ueno Heat exchanger and air conditioner having the heat exchanger mounted therein

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120024509A1 (en) * 2009-04-22 2012-02-02 Madoka Ueno Heat exchanger and air conditioner having the heat exchanger mounted therein

Similar Documents

Publication Publication Date Title
JPS56114269A (en) Scanning type electronic microscope
JPS5621321A (en) Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
JPS5759108A (en) Mark position detecting method for electron beam exposure
JPS5780649A (en) Electron ray energy analyzer
JPS56150303A (en) Surface form measuring device using scan-type electronic microscope
JPS54114173A (en) Electronic probe device
JPS57210549A (en) Method of correction attendant on deflection
GB1444737A (en) Electron beam projection systems anti-personnel projectile
JPS5796207A (en) Measuring apparatus for pattern dimensions
JPS5640244A (en) Beam scanning correction at electron beam exposure
JPS54138467A (en) Scanning type electron microscope or resembling apparatus
JPS55133887A (en) Electron beam radiation apparatus
JPS5578451A (en) Inspecting method of contamination in electron-optical system
JPS55137653A (en) Electron beam focus detector
JPS5541668A (en) Detecting method of character position
JPS54148483A (en) Automatic detecting method for reference mark of exposure
JPS6441216A (en) Electron beam lithography equipment
JPS5719948A (en) Electron beam device
JPS56130921A (en) Adjusting method of axis of charged particle beam
JPS5674383A (en) Electron beam welding method for needlelike linear material
KR840000875B1 (en) Vedeo signal system
JPS5625973A (en) Ion etching apparatus
JPS5683938A (en) Electron beam alignment process
JPS5779456A (en) Voltage readout system by electron beam
JPS556737A (en) Scan electron microscope