JPS54114173A - Electronic probe device - Google Patents

Electronic probe device

Info

Publication number
JPS54114173A
JPS54114173A JP2173878A JP2173878A JPS54114173A JP S54114173 A JPS54114173 A JP S54114173A JP 2173878 A JP2173878 A JP 2173878A JP 2173878 A JP2173878 A JP 2173878A JP S54114173 A JPS54114173 A JP S54114173A
Authority
JP
Japan
Prior art keywords
slit
power source
converging lens
acceleration voltage
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2173878A
Other languages
Japanese (ja)
Other versions
JPS5854463B2 (en
Inventor
Shojiro Tagata
Ichiro Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP53021738A priority Critical patent/JPS5854463B2/en
Publication of JPS54114173A publication Critical patent/JPS54114173A/en
Publication of JPS5854463B2 publication Critical patent/JPS5854463B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE: To secure the setting for the combination of the slit diameter and the exciting current of the converging lens which minimizes the diameter of the electronic probe against the desired acceleration voltage and the beam currenct by a simple operation of the high voltage power source and the shift axis.
CONSTITUTION: The acceleration voltage is set to the desired level by operation of high voltage power source 3, and the slit is selected according to the probe current value which is irradiated to sample 10. Then shift axis 14 is operated so that the selected slit may be positioned on optical axis 15. Thus, the signal corresponding to the acceleration voltage set by power source 3 along with the signal selected by slit detector circuit 17 and corresponding to the selected slit are supplied to converging lens power source 6. As a result, the exciting current to be supplied to converging lens 4 from converging lens power source 5 is adjusted automatically so that the thinnest electron beam probe may be formed under the conditons of the selected acceleration voltage and slit.
COPYRIGHT: (C)1979,JPO&Japio
JP53021738A 1978-02-27 1978-02-27 electronic probe device Expired JPS5854463B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53021738A JPS5854463B2 (en) 1978-02-27 1978-02-27 electronic probe device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53021738A JPS5854463B2 (en) 1978-02-27 1978-02-27 electronic probe device

Publications (2)

Publication Number Publication Date
JPS54114173A true JPS54114173A (en) 1979-09-06
JPS5854463B2 JPS5854463B2 (en) 1983-12-05

Family

ID=12063407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53021738A Expired JPS5854463B2 (en) 1978-02-27 1978-02-27 electronic probe device

Country Status (1)

Country Link
JP (1) JPS5854463B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4524277A (en) * 1981-12-18 1985-06-18 Hitachi, Ltd. Charged particle beam apparatus
US4547669A (en) * 1982-09-27 1985-10-15 Jeol Ltd. Electron beam scanning device
JPS6126249U (en) * 1984-07-24 1986-02-17 日本電子株式会社 Optimal aperture diameter indicator
JPS63108654A (en) * 1986-10-24 1988-05-13 Hitachi Ltd Ion source
JPH07220668A (en) * 1994-02-04 1995-08-18 Seiko Instr Inc Scanning electron microscope
JPH10106474A (en) * 1996-09-30 1998-04-24 Seiko Instr Inc Work device by ion beam
JP2010282977A (en) * 2010-09-13 2010-12-16 Hitachi High-Technologies Corp Electron beam device, and control method for the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6294148U (en) * 1985-11-29 1987-06-16

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4524277A (en) * 1981-12-18 1985-06-18 Hitachi, Ltd. Charged particle beam apparatus
US4547669A (en) * 1982-09-27 1985-10-15 Jeol Ltd. Electron beam scanning device
JPS6126249U (en) * 1984-07-24 1986-02-17 日本電子株式会社 Optimal aperture diameter indicator
JPS63108654A (en) * 1986-10-24 1988-05-13 Hitachi Ltd Ion source
JPH07220668A (en) * 1994-02-04 1995-08-18 Seiko Instr Inc Scanning electron microscope
JPH10106474A (en) * 1996-09-30 1998-04-24 Seiko Instr Inc Work device by ion beam
JP2010282977A (en) * 2010-09-13 2010-12-16 Hitachi High-Technologies Corp Electron beam device, and control method for the same

Also Published As

Publication number Publication date
JPS5854463B2 (en) 1983-12-05

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