JPS5796207A - Measuring apparatus for pattern dimensions - Google Patents

Measuring apparatus for pattern dimensions

Info

Publication number
JPS5796207A
JPS5796207A JP17162080A JP17162080A JPS5796207A JP S5796207 A JPS5796207 A JP S5796207A JP 17162080 A JP17162080 A JP 17162080A JP 17162080 A JP17162080 A JP 17162080A JP S5796207 A JPS5796207 A JP S5796207A
Authority
JP
Japan
Prior art keywords
pattern
portion containing
edge section
dimensions
level corresponding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17162080A
Other languages
Japanese (ja)
Other versions
JPS6327642B2 (en
Inventor
Yoshifusa Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP17162080A priority Critical patent/JPS5796207A/en
Publication of JPS5796207A publication Critical patent/JPS5796207A/en
Publication of JPS6327642B2 publication Critical patent/JPS6327642B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

PURPOSE:To improve the accuracy by determining a threshold level with interior division of a level corresponding to non-pattern portion containing no edge section and a level corresponding to the pattern portion containing no edge section at a specified ratio. CONSTITUTION:After shaped in an electronic lens system 201, an electron beam generated by an electron beam generation source 201 is deflected by a means 203 of deflection and irradiated on a sample 205. A signal of a pattern image obtained by the irradiation of the electron beam on the sample 205 is detected and amplified with a signal detection amplifier 207 to measure the pattern dimensions with a means 208 of measuring dimensions. The means 208 of measuring dimensions performs an interior division of a level corresponding to nonpattern portion containing no edge section and a level corresponding to the pattern portion containing no edge section at a specified ratio to determine the threshold level for the discrimination of the edge. Based on the threshold level thus obtained, the edge is discriminated to determine the pattern dimensions.
JP17162080A 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions Granted JPS5796207A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17162080A JPS5796207A (en) 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17162080A JPS5796207A (en) 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions

Publications (2)

Publication Number Publication Date
JPS5796207A true JPS5796207A (en) 1982-06-15
JPS6327642B2 JPS6327642B2 (en) 1988-06-03

Family

ID=15926543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17162080A Granted JPS5796207A (en) 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions

Country Status (1)

Country Link
JP (1) JPS5796207A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184859A2 (en) * 1984-12-14 1986-06-18 Hitachi, Ltd. Electron beam line width measurement system
US4741620A (en) * 1982-10-08 1988-05-03 National Research Development Corporation Irradiative probe system
JP2011192837A (en) * 2010-03-15 2011-09-29 Toshiba Corp Evaluating device and evaluating method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4741620A (en) * 1982-10-08 1988-05-03 National Research Development Corporation Irradiative probe system
EP0184859A2 (en) * 1984-12-14 1986-06-18 Hitachi, Ltd. Electron beam line width measurement system
US4740693A (en) * 1984-12-14 1988-04-26 Hitachi, Ltd. Electron beam pattern line width measurement system
JP2011192837A (en) * 2010-03-15 2011-09-29 Toshiba Corp Evaluating device and evaluating method

Also Published As

Publication number Publication date
JPS6327642B2 (en) 1988-06-03

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