JPS5796207A - Measuring apparatus for pattern dimensions - Google Patents
Measuring apparatus for pattern dimensionsInfo
- Publication number
- JPS5796207A JPS5796207A JP17162080A JP17162080A JPS5796207A JP S5796207 A JPS5796207 A JP S5796207A JP 17162080 A JP17162080 A JP 17162080A JP 17162080 A JP17162080 A JP 17162080A JP S5796207 A JPS5796207 A JP S5796207A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- portion containing
- edge section
- dimensions
- level corresponding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
PURPOSE:To improve the accuracy by determining a threshold level with interior division of a level corresponding to non-pattern portion containing no edge section and a level corresponding to the pattern portion containing no edge section at a specified ratio. CONSTITUTION:After shaped in an electronic lens system 201, an electron beam generated by an electron beam generation source 201 is deflected by a means 203 of deflection and irradiated on a sample 205. A signal of a pattern image obtained by the irradiation of the electron beam on the sample 205 is detected and amplified with a signal detection amplifier 207 to measure the pattern dimensions with a means 208 of measuring dimensions. The means 208 of measuring dimensions performs an interior division of a level corresponding to nonpattern portion containing no edge section and a level corresponding to the pattern portion containing no edge section at a specified ratio to determine the threshold level for the discrimination of the edge. Based on the threshold level thus obtained, the edge is discriminated to determine the pattern dimensions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17162080A JPS5796207A (en) | 1980-12-05 | 1980-12-05 | Measuring apparatus for pattern dimensions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17162080A JPS5796207A (en) | 1980-12-05 | 1980-12-05 | Measuring apparatus for pattern dimensions |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5796207A true JPS5796207A (en) | 1982-06-15 |
JPS6327642B2 JPS6327642B2 (en) | 1988-06-03 |
Family
ID=15926543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17162080A Granted JPS5796207A (en) | 1980-12-05 | 1980-12-05 | Measuring apparatus for pattern dimensions |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5796207A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0184859A2 (en) * | 1984-12-14 | 1986-06-18 | Hitachi, Ltd. | Electron beam line width measurement system |
US4741620A (en) * | 1982-10-08 | 1988-05-03 | National Research Development Corporation | Irradiative probe system |
JP2011192837A (en) * | 2010-03-15 | 2011-09-29 | Toshiba Corp | Evaluating device and evaluating method |
-
1980
- 1980-12-05 JP JP17162080A patent/JPS5796207A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4741620A (en) * | 1982-10-08 | 1988-05-03 | National Research Development Corporation | Irradiative probe system |
EP0184859A2 (en) * | 1984-12-14 | 1986-06-18 | Hitachi, Ltd. | Electron beam line width measurement system |
US4740693A (en) * | 1984-12-14 | 1988-04-26 | Hitachi, Ltd. | Electron beam pattern line width measurement system |
JP2011192837A (en) * | 2010-03-15 | 2011-09-29 | Toshiba Corp | Evaluating device and evaluating method |
Also Published As
Publication number | Publication date |
---|---|
JPS6327642B2 (en) | 1988-06-03 |
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