JPS5795628A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5795628A
JPS5795628A JP17088680A JP17088680A JPS5795628A JP S5795628 A JPS5795628 A JP S5795628A JP 17088680 A JP17088680 A JP 17088680A JP 17088680 A JP17088680 A JP 17088680A JP S5795628 A JPS5795628 A JP S5795628A
Authority
JP
Japan
Prior art keywords
signal
level
mark
scanned
amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17088680A
Other languages
Japanese (ja)
Inventor
Korehito Matsuda
Akinori Shibayama
Kiichi Takamoto
Hisatake Yokouchi
Masahide Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP17088680A priority Critical patent/JPS5795628A/en
Publication of JPS5795628A publication Critical patent/JPS5795628A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To automate level compensation and to perform always stable mark detection, by scanning a substrate to extract an offset level by the electron beam before the mark detection, and feeding back said level to an amplifier of the mark detecting signal. CONSTITUTION:The mark position provided on the substrate is scanned by the electron beam. A signal from a reflected electron detector 6 is amplified to obtain positioning data. A switch 5 is provided between the amplifier 1 of the detecting device and an output terminal 8. The substrate is scanned to detect the different states of the surface at various machining stages before the mark is scanned. Said amplified signal is fed back to the amplifier 1 through the swtich 5, AD converter 4, a registor 3, and a DA converter 2, so that the signal output (the detected signal at the offset level) besed on the surface state becomes a zero level. In this constitution, the offset level compensation at every machining stage can be automatically performed, and the mark detection can be performed at the constant signal level. Therefore the positioning accuracy and the reliability can be improved.
JP17088680A 1980-12-05 1980-12-05 Electron beam exposure device Pending JPS5795628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17088680A JPS5795628A (en) 1980-12-05 1980-12-05 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17088680A JPS5795628A (en) 1980-12-05 1980-12-05 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5795628A true JPS5795628A (en) 1982-06-14

Family

ID=15913133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17088680A Pending JPS5795628A (en) 1980-12-05 1980-12-05 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5795628A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125623A (en) * 1982-12-27 1984-07-20 Fujitsu Ltd Electron beam exposure device
US4705954A (en) * 1984-09-04 1987-11-10 Siemens Aktiengesellschaft Method and apparatus for automatically positioning a particle beam

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5585028A (en) * 1978-12-22 1980-06-26 Hitachi Ltd Mark detecting signal amplifier

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5585028A (en) * 1978-12-22 1980-06-26 Hitachi Ltd Mark detecting signal amplifier

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125623A (en) * 1982-12-27 1984-07-20 Fujitsu Ltd Electron beam exposure device
US4705954A (en) * 1984-09-04 1987-11-10 Siemens Aktiengesellschaft Method and apparatus for automatically positioning a particle beam

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