JPS6441216A - Electron beam lithography equipment - Google Patents
Electron beam lithography equipmentInfo
- Publication number
- JPS6441216A JPS6441216A JP19880987A JP19880987A JPS6441216A JP S6441216 A JPS6441216 A JP S6441216A JP 19880987 A JP19880987 A JP 19880987A JP 19880987 A JP19880987 A JP 19880987A JP S6441216 A JPS6441216 A JP S6441216A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- main body
- optimum
- exposure
- conditions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To control a plurality of exposure main bodies simultaneously by a pair of drawing circuits by computing the optimum drawing signals of sub-exposure main bodies from optimum drawing signals transmitted over main exposure main bodies from the drawing circuits and transmitting the optimum drawing signals of the sub- exposure main bodies over the sub-exposure main bodies. CONSTITUTION:The conditions of electron-beam optimum irradiation of a main exposure main body 19 and the conditions of electron-beam optimum irradiation of a sub-exposure main body 19a are input previously to a storage circuit 25. New samples are placed onto sample movable carriages 23, 23d, electron beams are adjusted to the sample by an electron-beam deflecting coil 22 in the main body 19, and the electron-beam optimum conditions of the main body 19 to the sample are computed by an electron-beam deflection circuit 14. The electron-beam optimum irradiation correction factor of the main body 19a to the main body 19 is read by a correction circuit 26 from the circuit 25, and the electron-beam optimum conditions of the main body 19a are computed by the circuit 26 from the correction factor and the electron- beam optimum conditions of the main body 19. The electron-beam optimum conditions of the main body 19a are input to an electron-beam deflecting coil 22a through an interface 24.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19880987A JPS6441216A (en) | 1987-08-06 | 1987-08-06 | Electron beam lithography equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19880987A JPS6441216A (en) | 1987-08-06 | 1987-08-06 | Electron beam lithography equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6441216A true JPS6441216A (en) | 1989-02-13 |
Family
ID=16397270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19880987A Pending JPS6441216A (en) | 1987-08-06 | 1987-08-06 | Electron beam lithography equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6441216A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5981118A (en) * | 1997-04-11 | 1999-11-09 | Fujitsu Ltd. | Method for charged particle beam exposure with fixed barycenter through balancing stage scan |
KR19990088179A (en) * | 1998-05-12 | 1999-12-27 | 히로시 오우라 | Electron-beam lithography system |
US6398872B1 (en) * | 1998-07-01 | 2002-06-04 | Asahi Kogaku Kogyo Kabushiki Kaisha | Circuit forming apparatus of semiconductor device |
-
1987
- 1987-08-06 JP JP19880987A patent/JPS6441216A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5981118A (en) * | 1997-04-11 | 1999-11-09 | Fujitsu Ltd. | Method for charged particle beam exposure with fixed barycenter through balancing stage scan |
KR19990088179A (en) * | 1998-05-12 | 1999-12-27 | 히로시 오우라 | Electron-beam lithography system |
US6398872B1 (en) * | 1998-07-01 | 2002-06-04 | Asahi Kogaku Kogyo Kabushiki Kaisha | Circuit forming apparatus of semiconductor device |
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