JPS6441216A - Electron beam lithography equipment - Google Patents

Electron beam lithography equipment

Info

Publication number
JPS6441216A
JPS6441216A JP19880987A JP19880987A JPS6441216A JP S6441216 A JPS6441216 A JP S6441216A JP 19880987 A JP19880987 A JP 19880987A JP 19880987 A JP19880987 A JP 19880987A JP S6441216 A JPS6441216 A JP S6441216A
Authority
JP
Japan
Prior art keywords
electron
main body
optimum
exposure
conditions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19880987A
Other languages
Japanese (ja)
Inventor
Shunichi Naka
Fumio Yoshimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP19880987A priority Critical patent/JPS6441216A/en
Publication of JPS6441216A publication Critical patent/JPS6441216A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To control a plurality of exposure main bodies simultaneously by a pair of drawing circuits by computing the optimum drawing signals of sub-exposure main bodies from optimum drawing signals transmitted over main exposure main bodies from the drawing circuits and transmitting the optimum drawing signals of the sub- exposure main bodies over the sub-exposure main bodies. CONSTITUTION:The conditions of electron-beam optimum irradiation of a main exposure main body 19 and the conditions of electron-beam optimum irradiation of a sub-exposure main body 19a are input previously to a storage circuit 25. New samples are placed onto sample movable carriages 23, 23d, electron beams are adjusted to the sample by an electron-beam deflecting coil 22 in the main body 19, and the electron-beam optimum conditions of the main body 19 to the sample are computed by an electron-beam deflection circuit 14. The electron-beam optimum irradiation correction factor of the main body 19a to the main body 19 is read by a correction circuit 26 from the circuit 25, and the electron-beam optimum conditions of the main body 19a are computed by the circuit 26 from the correction factor and the electron- beam optimum conditions of the main body 19. The electron-beam optimum conditions of the main body 19a are input to an electron-beam deflecting coil 22a through an interface 24.
JP19880987A 1987-08-06 1987-08-06 Electron beam lithography equipment Pending JPS6441216A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19880987A JPS6441216A (en) 1987-08-06 1987-08-06 Electron beam lithography equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19880987A JPS6441216A (en) 1987-08-06 1987-08-06 Electron beam lithography equipment

Publications (1)

Publication Number Publication Date
JPS6441216A true JPS6441216A (en) 1989-02-13

Family

ID=16397270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19880987A Pending JPS6441216A (en) 1987-08-06 1987-08-06 Electron beam lithography equipment

Country Status (1)

Country Link
JP (1) JPS6441216A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5981118A (en) * 1997-04-11 1999-11-09 Fujitsu Ltd. Method for charged particle beam exposure with fixed barycenter through balancing stage scan
KR19990088179A (en) * 1998-05-12 1999-12-27 히로시 오우라 Electron-beam lithography system
US6398872B1 (en) * 1998-07-01 2002-06-04 Asahi Kogaku Kogyo Kabushiki Kaisha Circuit forming apparatus of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5981118A (en) * 1997-04-11 1999-11-09 Fujitsu Ltd. Method for charged particle beam exposure with fixed barycenter through balancing stage scan
KR19990088179A (en) * 1998-05-12 1999-12-27 히로시 오우라 Electron-beam lithography system
US6398872B1 (en) * 1998-07-01 2002-06-04 Asahi Kogaku Kogyo Kabushiki Kaisha Circuit forming apparatus of semiconductor device

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