JPS5683029A - Adjusting method of beam measurement - Google Patents
Adjusting method of beam measurementInfo
- Publication number
- JPS5683029A JPS5683029A JP16062079A JP16062079A JPS5683029A JP S5683029 A JPS5683029 A JP S5683029A JP 16062079 A JP16062079 A JP 16062079A JP 16062079 A JP16062079 A JP 16062079A JP S5683029 A JPS5683029 A JP S5683029A
- Authority
- JP
- Japan
- Prior art keywords
- measured
- measurements
- section
- value
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To reduce the error between the command value and the actual value as well as to improve the accuracy of exposure of an electronic beam by a method wherein the measurements at the time of maximum section and the current value thereon, and the current value at the time of minimum section of an electron beam is measured in advance, and a deflecting device is controlled based on these measured values. CONSTITUTION:A scanning by the electron beam which is adjusted to the prescribed measurements is performed by employing the electronic beam section varying device 3 consisted of the deflectors dx and dy, which is functioned by the measurement command sent from CPU4, masks m1 and m2 and the like. In such a case as above, the beam is scanned by a scanning deflector 11 by giving a maximum measurement command in the state of condition wherein a Faraday cup 15 is excluded, its measurements are measured by a detector 9, the difference between the command value and the measured value is detected and the difference is adjusted by giving the signal in proportion to the error to a level regulators 18x and 18y. Also the values obtained at the time of maximum section and minimum section are measured in the state of condition wherein the Faraday cup is arranged, the values are memorized at the CPU4 and the deflection device 3 is controlled based on these results of measurements. As a result, the accuracy of the electron beam exposure can be improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16062079A JPS5683029A (en) | 1979-12-11 | 1979-12-11 | Adjusting method of beam measurement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16062079A JPS5683029A (en) | 1979-12-11 | 1979-12-11 | Adjusting method of beam measurement |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5683029A true JPS5683029A (en) | 1981-07-07 |
JPS5759661B2 JPS5759661B2 (en) | 1982-12-15 |
Family
ID=15718861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16062079A Granted JPS5683029A (en) | 1979-12-11 | 1979-12-11 | Adjusting method of beam measurement |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5683029A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1300870A1 (en) * | 2001-10-05 | 2003-04-09 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multiple electron beam device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54108580A (en) * | 1978-02-13 | 1979-08-25 | Jeol Ltd | Electron-beam exposure device |
-
1979
- 1979-12-11 JP JP16062079A patent/JPS5683029A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54108580A (en) * | 1978-02-13 | 1979-08-25 | Jeol Ltd | Electron-beam exposure device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1300870A1 (en) * | 2001-10-05 | 2003-04-09 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multiple electron beam device |
WO2003032361A1 (en) * | 2001-10-05 | 2003-04-17 | Ict, Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh | Multiple electron beam device |
EP1768162A2 (en) * | 2001-10-05 | 2007-03-28 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh | Multiple electron beam device |
EP1768162A3 (en) * | 2001-10-05 | 2007-05-09 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh | Multiple electron beam device |
US7282711B2 (en) | 2001-10-05 | 2007-10-16 | Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Multiple electron beam device |
Also Published As
Publication number | Publication date |
---|---|
JPS5759661B2 (en) | 1982-12-15 |
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