JPS5683029A - Adjusting method of beam measurement - Google Patents

Adjusting method of beam measurement

Info

Publication number
JPS5683029A
JPS5683029A JP16062079A JP16062079A JPS5683029A JP S5683029 A JPS5683029 A JP S5683029A JP 16062079 A JP16062079 A JP 16062079A JP 16062079 A JP16062079 A JP 16062079A JP S5683029 A JPS5683029 A JP S5683029A
Authority
JP
Japan
Prior art keywords
measured
measurements
section
value
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16062079A
Other languages
Japanese (ja)
Other versions
JPS5759661B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Takao Namae
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP16062079A priority Critical patent/JPS5683029A/en
Publication of JPS5683029A publication Critical patent/JPS5683029A/en
Publication of JPS5759661B2 publication Critical patent/JPS5759661B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Abstract

PURPOSE:To reduce the error between the command value and the actual value as well as to improve the accuracy of exposure of an electronic beam by a method wherein the measurements at the time of maximum section and the current value thereon, and the current value at the time of minimum section of an electron beam is measured in advance, and a deflecting device is controlled based on these measured values. CONSTITUTION:A scanning by the electron beam which is adjusted to the prescribed measurements is performed by employing the electronic beam section varying device 3 consisted of the deflectors dx and dy, which is functioned by the measurement command sent from CPU4, masks m1 and m2 and the like. In such a case as above, the beam is scanned by a scanning deflector 11 by giving a maximum measurement command in the state of condition wherein a Faraday cup 15 is excluded, its measurements are measured by a detector 9, the difference between the command value and the measured value is detected and the difference is adjusted by giving the signal in proportion to the error to a level regulators 18x and 18y. Also the values obtained at the time of maximum section and minimum section are measured in the state of condition wherein the Faraday cup is arranged, the values are memorized at the CPU4 and the deflection device 3 is controlled based on these results of measurements. As a result, the accuracy of the electron beam exposure can be improved.
JP16062079A 1979-12-11 1979-12-11 Adjusting method of beam measurement Granted JPS5683029A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16062079A JPS5683029A (en) 1979-12-11 1979-12-11 Adjusting method of beam measurement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16062079A JPS5683029A (en) 1979-12-11 1979-12-11 Adjusting method of beam measurement

Publications (2)

Publication Number Publication Date
JPS5683029A true JPS5683029A (en) 1981-07-07
JPS5759661B2 JPS5759661B2 (en) 1982-12-15

Family

ID=15718861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16062079A Granted JPS5683029A (en) 1979-12-11 1979-12-11 Adjusting method of beam measurement

Country Status (1)

Country Link
JP (1) JPS5683029A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1300870A1 (en) * 2001-10-05 2003-04-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multiple electron beam device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54108580A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54108580A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1300870A1 (en) * 2001-10-05 2003-04-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multiple electron beam device
WO2003032361A1 (en) * 2001-10-05 2003-04-17 Ict, Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh Multiple electron beam device
EP1768162A2 (en) * 2001-10-05 2007-03-28 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Multiple electron beam device
EP1768162A3 (en) * 2001-10-05 2007-05-09 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Multiple electron beam device
US7282711B2 (en) 2001-10-05 2007-10-16 Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Multiple electron beam device

Also Published As

Publication number Publication date
JPS5759661B2 (en) 1982-12-15

Similar Documents

Publication Publication Date Title
GB2021789A (en) Monitoring voltage using an electron beam probe
JPS5731134A (en) Drawing device by electron beam
DD218700A5 (en) ELECTRON BEAM TRANSMISSION SYSTEM WITH SELF-FOCUSING DEVICE
JPS5683029A (en) Adjusting method of beam measurement
JPS57210549A (en) Method of correction attendant on deflection
JPS5536990A (en) Apparatus for applying electron beam
JPS5359455A (en) Radiation measuring apparatus
US4686466A (en) Method for automatically setting the voltage resolution in particle beam measuring devices and apparatus for implementation thereof
JPS5521237A (en) Scanning method of light printer
JPS5636058A (en) Measuring system for surface electric potential
JPS5546447A (en) Electron beam device
JPS53131755A (en) Scanning electronic microscope and such devices
JPS56136446A (en) Ion injector
JPS52103966A (en) Deflection unit for charged particle ray exposure device
JPS5588330A (en) Exposing method for electron beam
JPS57198628A (en) Inspecting device for pattern
JPS56107185A (en) Beam measurement
JPS5595326A (en) Electron beam exposure device
JPS5586057A (en) Detecting method of electron beam axis
JPS5648135A (en) Painting for electron beam and device therefor
JPS55125630A (en) Electron beam apparatus
JPS5759108A (en) Mark position detecting method for electron beam exposure
JPS5633829A (en) Inspection of pattern
JPS57138138A (en) Adjusting method electron ray exposing device
JPS57109334A (en) Electron beam exposing device