JPS57109334A - Electron beam exposing device - Google Patents
Electron beam exposing deviceInfo
- Publication number
- JPS57109334A JPS57109334A JP18582280A JP18582280A JPS57109334A JP S57109334 A JPS57109334 A JP S57109334A JP 18582280 A JP18582280 A JP 18582280A JP 18582280 A JP18582280 A JP 18582280A JP S57109334 A JPS57109334 A JP S57109334A
- Authority
- JP
- Japan
- Prior art keywords
- length
- horizontal
- measuring device
- vertical
- memory circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To perform the matching of the coordinate of a deflecting system and the coordinate of length-measuring system by a method wherein the length and inclination of scanning and the like are calibrated based on the value of positional detection, at least at three points by shifting marks, and the values of horizontal and vertical length of measurement of a table. CONSTITUTION:The table 1 is shifted in horizontal direction using a horizontal driving mechanism 7, and also the table is shifted in vertical direction using a vertical driving mechanism 8. The amount of these shiftings is measured by a horizontal length-measuring device 9 and a vertical length measuring device 10. Each measured value of the horizontal length measuring device 9 and the vertical length measuring device 10 is sent to an edge position memory circuit 11. The reflected electron signal sent from the table 1 of electron beam is detected by a detector 12, and this detected signal, together with each value of measured length, is sent to the edge position memory circuit 11. And the information memorized in the edge position memory circuit is processed by a CPU and the like, and the center position of the mark 2 can be detected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18582280A JPS5917531B2 (en) | 1980-12-26 | 1980-12-26 | Electron beam exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18582280A JPS5917531B2 (en) | 1980-12-26 | 1980-12-26 | Electron beam exposure equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57109334A true JPS57109334A (en) | 1982-07-07 |
JPS5917531B2 JPS5917531B2 (en) | 1984-04-21 |
Family
ID=16177478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18582280A Expired JPS5917531B2 (en) | 1980-12-26 | 1980-12-26 | Electron beam exposure equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5917531B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS642437U (en) * | 1987-06-24 | 1989-01-09 |
-
1980
- 1980-12-26 JP JP18582280A patent/JPS5917531B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS642437U (en) * | 1987-06-24 | 1989-01-09 |
Also Published As
Publication number | Publication date |
---|---|
JPS5917531B2 (en) | 1984-04-21 |
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