JPS57109334A - Electron beam exposing device - Google Patents

Electron beam exposing device

Info

Publication number
JPS57109334A
JPS57109334A JP18582280A JP18582280A JPS57109334A JP S57109334 A JPS57109334 A JP S57109334A JP 18582280 A JP18582280 A JP 18582280A JP 18582280 A JP18582280 A JP 18582280A JP S57109334 A JPS57109334 A JP S57109334A
Authority
JP
Japan
Prior art keywords
length
horizontal
measuring device
vertical
memory circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18582280A
Other languages
Japanese (ja)
Other versions
JPS5917531B2 (en
Inventor
Hideo Kusakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP18582280A priority Critical patent/JPS5917531B2/en
Publication of JPS57109334A publication Critical patent/JPS57109334A/en
Publication of JPS5917531B2 publication Critical patent/JPS5917531B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To perform the matching of the coordinate of a deflecting system and the coordinate of length-measuring system by a method wherein the length and inclination of scanning and the like are calibrated based on the value of positional detection, at least at three points by shifting marks, and the values of horizontal and vertical length of measurement of a table. CONSTITUTION:The table 1 is shifted in horizontal direction using a horizontal driving mechanism 7, and also the table is shifted in vertical direction using a vertical driving mechanism 8. The amount of these shiftings is measured by a horizontal length-measuring device 9 and a vertical length measuring device 10. Each measured value of the horizontal length measuring device 9 and the vertical length measuring device 10 is sent to an edge position memory circuit 11. The reflected electron signal sent from the table 1 of electron beam is detected by a detector 12, and this detected signal, together with each value of measured length, is sent to the edge position memory circuit 11. And the information memorized in the edge position memory circuit is processed by a CPU and the like, and the center position of the mark 2 can be detected.
JP18582280A 1980-12-26 1980-12-26 Electron beam exposure equipment Expired JPS5917531B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18582280A JPS5917531B2 (en) 1980-12-26 1980-12-26 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18582280A JPS5917531B2 (en) 1980-12-26 1980-12-26 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS57109334A true JPS57109334A (en) 1982-07-07
JPS5917531B2 JPS5917531B2 (en) 1984-04-21

Family

ID=16177478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18582280A Expired JPS5917531B2 (en) 1980-12-26 1980-12-26 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5917531B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642437U (en) * 1987-06-24 1989-01-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642437U (en) * 1987-06-24 1989-01-09

Also Published As

Publication number Publication date
JPS5917531B2 (en) 1984-04-21

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