JPS642437U - - Google Patents
Info
- Publication number
- JPS642437U JPS642437U JP9710287U JP9710287U JPS642437U JP S642437 U JPS642437 U JP S642437U JP 9710287 U JP9710287 U JP 9710287U JP 9710287 U JP9710287 U JP 9710287U JP S642437 U JPS642437 U JP S642437U
- Authority
- JP
- Japan
- Prior art keywords
- mark
- orthogonality
- holder
- detects
- detection element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Beam Exposure (AREA)
Description
第１図は本考案の一実施例のブロツク図、第２
図は本考案の一実施例のホルダ平面図、第３図は
ステージ上の本考案の一実施例のホルダ斜視図、
第４図は本考案の一実施例の要部断面図、第５図
は十字マークの一例の斜視図、第６図は反射ビー
ムと受光素子との位置関係を示す図、第７図は第
１図の動作説明用波形図である。
図において、１は十字マーク、２は偏向器、４
は検出素子、６は微分回路、７は演算回路、８は
制御回路、１０はホルダ、１１は試料、１２ａ，
１２ｂはホルダ部、１３ａ〜１３ｃは十字マーク
群、１４はステージである。
Fig. 1 is a block diagram of an embodiment of the present invention;
The figure is a plan view of a holder according to an embodiment of the present invention, and FIG. 3 is a perspective view of a holder according to an embodiment of the present invention on a stage.
FIG. 4 is a sectional view of essential parts of an embodiment of the present invention, FIG. 5 is a perspective view of an example of a cross mark, FIG. 6 is a diagram showing the positional relationship between the reflected beam and the light receiving element, and FIG. FIG. 2 is a waveform diagram for explaining the operation of FIG. 1; In the figure, 1 is a cross mark, 2 is a deflector, 4
is a detection element, 6 is a differential circuit, 7 is an arithmetic circuit, 8 is a control circuit, 10 is a holder, 11 is a sample, 12a,
12b is a holder part, 13a to 13c are a group of cross marks, and 14 is a stage.
Claims (1)
ターンを描く電子ビーム露光装置において、 直交度及び平坦度のうち少なくとも直交度の測
定を行なうために前記ホルダの一部に設けられた
マーク１と、 該マーク１からの反射ビームを検出する検出素
子４と、 該受光素子４から信号により該マーク１の位置
を検出し、その検出値から少なくとも直交度の測
定値を得る手段６，７と、 該測定値に基づいて前記試料上へのビーム偏向
量を実質的に補正する補生手段２，８とを備えた
電子ビーム露光装置。[Claims for Utility Model Registration] In an electron beam exposure apparatus that draws a desired exposure pattern on a sample fixed by a holder, a part of the holder is provided in order to measure at least the orthogonality of the orthogonality and flatness. A mark 1 provided, a detection element 4 that detects the reflected beam from the mark 1, a detection element 4 that detects the position of the mark 1 based on a signal from the light receiving element 4, and obtains at least a measured value of orthogonality from the detected value. An electron beam exposure apparatus comprising means 6 and 7, and correction means 2 and 8 for substantially correcting the amount of beam deflection onto the sample based on the measured value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9710287U JPS642437U (en) | 1987-06-24 | 1987-06-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9710287U JPS642437U (en) | 1987-06-24 | 1987-06-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS642437U true JPS642437U (en) | 1989-01-09 |
Family
ID=31322323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9710287U Pending JPS642437U (en) | 1987-06-24 | 1987-06-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS642437U (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5459884A (en) * | 1977-10-21 | 1979-05-14 | Hitachi Ltd | Electron beam lithography apparatus |
| JPS57109334A (en) * | 1980-12-26 | 1982-07-07 | Toshiba Corp | Electron beam exposing device |
| JPS60254615A (en) * | 1984-05-30 | 1985-12-16 | Toshiba Mach Co Ltd | Electron beam exposure |
-
1987
- 1987-06-24 JP JP9710287U patent/JPS642437U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5459884A (en) * | 1977-10-21 | 1979-05-14 | Hitachi Ltd | Electron beam lithography apparatus |
| JPS57109334A (en) * | 1980-12-26 | 1982-07-07 | Toshiba Corp | Electron beam exposing device |
| JPS60254615A (en) * | 1984-05-30 | 1985-12-16 | Toshiba Mach Co Ltd | Electron beam exposure |
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