JPS5459884A - Electron beam lithography apparatus - Google Patents

Electron beam lithography apparatus

Info

Publication number
JPS5459884A
JPS5459884A JP12584377A JP12584377A JPS5459884A JP S5459884 A JPS5459884 A JP S5459884A JP 12584377 A JP12584377 A JP 12584377A JP 12584377 A JP12584377 A JP 12584377A JP S5459884 A JPS5459884 A JP S5459884A
Authority
JP
Japan
Prior art keywords
sample base
computer
mark
measuring instrument
reflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12584377A
Other languages
Japanese (ja)
Other versions
JPS5952534B2 (en
Inventor
Kazumitsu Nakamura
Shinjiro Katagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52125843A priority Critical patent/JPS5952534B2/en
Publication of JPS5459884A publication Critical patent/JPS5459884A/en
Publication of JPS5952534B2 publication Critical patent/JPS5952534B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain precision lithography by adding two reference marks in separate positions on a sample base, measuring the distance therebetween with a laser interference length measuring instrument and performing temperature compensation of electron beam radiation position.
CONSTITUTION: Two reference marks 7X, 7Y are newly provided in addition to a reference mark 7 provided on a sample base 4, and a laser interference length measuring instrument and mirrors 13, 13X, 13Y for projecting laser light 16 to the reflecting faces 5X, 5Y of the mirror 5 mounted to the sample base 4 are disposed in proximity to the sample base 4. With such constitution, first the position of the mark 7 is detected with a reflecting electron detector 6 and is sent to a computer 10 via coding mechanism 9. At the same time, the distance between the reflecting face 5X and morror 13X, and between the reflecting face 5Y and mirror 13Y are measured and are applied to the computer 10. Next, the sample base 14 provided on the sample base 4 is moved to the mark 7X and the distance thereof is measured with the length measuring instrument 11. The amount of deviation of the sample base 14 accompanied with the temperature change is then computed with the computer 10 and is corrected with a deflector 3
COPYRIGHT: (C)1979,JPO&Japio
JP52125843A 1977-10-21 1977-10-21 Electron beam lithography equipment Expired JPS5952534B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52125843A JPS5952534B2 (en) 1977-10-21 1977-10-21 Electron beam lithography equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52125843A JPS5952534B2 (en) 1977-10-21 1977-10-21 Electron beam lithography equipment

Publications (2)

Publication Number Publication Date
JPS5459884A true JPS5459884A (en) 1979-05-14
JPS5952534B2 JPS5952534B2 (en) 1984-12-20

Family

ID=14920310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52125843A Expired JPS5952534B2 (en) 1977-10-21 1977-10-21 Electron beam lithography equipment

Country Status (1)

Country Link
JP (1) JPS5952534B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254615A (en) * 1984-05-30 1985-12-16 Toshiba Mach Co Ltd Electron beam exposure
JPS642437U (en) * 1987-06-24 1989-01-09
JPH02241022A (en) * 1989-03-15 1990-09-25 Hikari Keisoku Gijutsu Kaihatsu Kk Electron beam exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254615A (en) * 1984-05-30 1985-12-16 Toshiba Mach Co Ltd Electron beam exposure
JPS642437U (en) * 1987-06-24 1989-01-09
JPH02241022A (en) * 1989-03-15 1990-09-25 Hikari Keisoku Gijutsu Kaihatsu Kk Electron beam exposure apparatus

Also Published As

Publication number Publication date
JPS5952534B2 (en) 1984-12-20

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