JPS54109382A - Electron ray exposure - Google Patents
Electron ray exposureInfo
- Publication number
- JPS54109382A JPS54109382A JP1627178A JP1627178A JPS54109382A JP S54109382 A JPS54109382 A JP S54109382A JP 1627178 A JP1627178 A JP 1627178A JP 1627178 A JP1627178 A JP 1627178A JP S54109382 A JPS54109382 A JP S54109382A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- value
- zero
- motor
- shift
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1627178A JPS54109382A (en) | 1978-02-15 | 1978-02-15 | Electron ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1627178A JPS54109382A (en) | 1978-02-15 | 1978-02-15 | Electron ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54109382A true JPS54109382A (en) | 1979-08-27 |
JPS5731290B2 JPS5731290B2 (ja) | 1982-07-03 |
Family
ID=11911873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1627178A Granted JPS54109382A (en) | 1978-02-15 | 1978-02-15 | Electron ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54109382A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5588328A (en) * | 1978-12-27 | 1980-07-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Exposing method to electron beam |
JPS59135727A (ja) * | 1983-01-24 | 1984-08-04 | Jeol Ltd | 荷電粒子ビ−ム露光方法 |
JPS59169132A (ja) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | 電子線描画装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62160975A (ja) * | 1986-12-25 | 1987-07-16 | 本田技研工業株式会社 | リヤクツシヨンユニツトの冷却装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549768A (en) * | 1978-10-02 | 1980-04-10 | Ibm | Data processor |
-
1978
- 1978-02-15 JP JP1627178A patent/JPS54109382A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549768A (en) * | 1978-10-02 | 1980-04-10 | Ibm | Data processor |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5588328A (en) * | 1978-12-27 | 1980-07-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Exposing method to electron beam |
JPS6244406B2 (ja) * | 1978-12-27 | 1987-09-21 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai | |
JPS59135727A (ja) * | 1983-01-24 | 1984-08-04 | Jeol Ltd | 荷電粒子ビ−ム露光方法 |
JPS59169132A (ja) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | 電子線描画装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS5731290B2 (ja) | 1982-07-03 |
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